Low Temperature Microcrystalline Silicon Solar Cells Prepared by Hot-Wire Chemical Vapor Deposition

2006 IEEE 4th World Conference on Photovoltaic Energy Conference ◽

10.1109/wcpec.2006.279800 ◽

2006 ◽

Cited By ~ 1

Author(s):

M.M. Adachi ◽

W.f.l. Tse ◽

K.S. Karim

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Hot Wire ◽

Microcrystalline Silicon

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Highly transparent microcrystalline silicon carbide grown with hot wire chemical vapor deposition as window layers in n-i-p microcrystalline silicon solar cells

Applied Physics Letters ◽

10.1063/1.2739335 ◽

2007 ◽

Vol 90 (20) ◽

pp. 203502 ◽

Cited By ~ 34

Author(s):

Y. Huang ◽

A. Dasgupta ◽

A. Gordijn ◽

F. Finger ◽

R. Carius

Keyword(s):

Silicon Carbide ◽

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Hot Wire ◽

Microcrystalline Silicon

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Hot-wire chemical vapor deposition prepared aluminum doped p-type microcrystalline silicon carbide window layers for thin film silicon solar cells

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.05fm04 ◽

2014 ◽

Vol 53 (5S1) ◽

pp. 05FM04 ◽

Cited By ~ 7

Author(s):

Tao Chen ◽

Florian Köhler ◽

Anna Heidt ◽

Reinhard Carius ◽

Friedhelm Finger

Keyword(s):

Thin Film ◽

Silicon Carbide ◽

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Hot Wire ◽

Microcrystalline Silicon ◽

P Type

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Present status of micro- and polycrystalline silicon solar cells made by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2003.10.126 ◽

2004 ◽

Vol 451-452 ◽

pp. 455-465 ◽

Cited By ~ 59

Author(s):

Ruud E.I. Schropp

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Present Status ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Hot Wire

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Hot-wire chemical vapor deposition of silicon nitride for multicrystalline silicon solar cells

Conference Record of the Thirty-first IEEE Photovoltaic Specialists Conference 2005 PVSC-05 ◽

10.1109/pvsc.2005.1488366 ◽

2005 ◽

Author(s):

H.D. Goldbach ◽

C.H.M. van der Werf ◽

J. Loffler ◽

A. Scarfo ◽

A.M.C. Kylner ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Multicrystalline Silicon ◽

Silicon Solar Cells ◽

Hot Wire

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High-efficiency microcrystalline silicon solar cells on honeycomb textured substrates grown with high-rate VHF plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.08kb05 ◽

2015 ◽

Vol 54 (8S1) ◽

pp. 08KB05 ◽

Cited By ~ 54

Author(s):

Hitoshi Sai ◽

Keigo Maejima ◽

Takuya Matsui ◽

Takashi Koida ◽

Michio Kondo ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

High Rate ◽

Silicon Solar Cells ◽

Microcrystalline Silicon

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Comprehensive study of microcrystalline silicon solar cells deposited at high rate using 13.56 MHz plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1450585 ◽

2002 ◽

Vol 20 (2) ◽

pp. 492-498 ◽

Cited By ~ 94

Author(s):

T. Roschek ◽

T. Repmann ◽

J. Müller ◽

B. Rech ◽

H. Wagner

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Rate ◽

Silicon Solar Cells ◽

Microcrystalline Silicon ◽

Comprehensive Study

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Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.07.140 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 133-136 ◽

Cited By ~ 5

Author(s):

Jean-Eric Bourée ◽

Sandesh R. Jadkar ◽

Samir Kasouit ◽

Régis Vanderhaghen

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Silicon Thin Films

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Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells

Thin Solid Films ◽

10.1016/j.tsf.2005.07.107 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 51-54 ◽

Cited By ~ 23

Author(s):

C.H.M. van der Werf ◽

H.D. Goldbach ◽

J. Löffler ◽

A. Scarfó ◽

A.M.C. Kylner ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Deposition Rate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Multicrystalline Silicon ◽

Silicon Solar Cells ◽

High Deposition Rate ◽

Hot Wire

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Epitaxial film silicon solar cells fabricated by hot wire chemical vapor deposition below 750°C

2009 34th IEEE Photovoltaic Specialists Conference (PVSC) ◽

10.1109/pvsc.2009.5411276 ◽

2009 ◽

Author(s):

Kirstin Alberi ◽

Ina T. Marti ◽

Maxim Shub ◽

Charles W. Teplin ◽

Eugene Iwaniczko ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Epitaxial Film ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Hot Wire

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Effects of seeding methods on the fabrication of microcrystalline silicon solar cells using radio frequency plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.12.029 ◽

2005 ◽

Vol 483 (1-2) ◽

pp. 84-88 ◽

Cited By ~ 14

Author(s):

Yuan-Min Li ◽

Liwei Li ◽

J.A. Anna Selvan ◽

Alan E. Delahoy ◽

Roland A. Levy

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Radio Frequency Plasma ◽

Microcrystalline Silicon ◽

Frequency Plasma

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