Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography

1999 ◽  
Vol 17 (2) ◽  
pp. 334 ◽  
Author(s):  
Geoffrey W. Reynolds ◽  
James W. Taylor
Keyword(s):  
Sidewall Roughness ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

FT-IR Study of a Chemically Amplified Resist for X-ray Lithography

2003 ◽  
Vol 57 (7) ◽  
pp. 842-849 ◽  
Author(s):  
T. L. Tan ◽  
V. A. Kudryashov ◽  
B. L. Tan
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Ft Ir ◽  
Ir Study

UVN2-negative chemically amplified resist optimization for x-ray mask fabrication

1999 ◽  
Author(s):  
Janet M. Rocque ◽  
Michael J. Lercel ◽  
Cameron J. Brooks ◽  
Richard W. Henry ◽  
Douglas E. Benoit
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography

1991 ◽  
Vol 30 (Part 1, No. 10) ◽  
pp. 2619-2625 ◽  
Author(s):  
Jiro Nakamura ◽  
Hiroshi Ban ◽  
Kimiyoshi Deguchi ◽  
Akinobu Tanaka
Keyword(s):  
X Ray ◽  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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