Effect of processing on surface roughness for a negative-tone chemically amplified resist exposed by x-ray lithography

1998 ◽  
Author(s):  
Geoffrey W. Reynolds ◽  
James W. Taylor
Keyword(s):  
Surface Roughness ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Naoko Ito ◽  
Daisuke Inokuchi ◽  
Yasushi Nishiyama ◽  
Yuichi Fukushima ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

FT-IR Study of a Chemically Amplified Resist for X-ray Lithography

2003 ◽  
Vol 57 (7) ◽  
pp. 842-849 ◽  
Author(s):  
T. L. Tan ◽  
V. A. Kudryashov ◽  
B. L. Tan
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Ft Ir ◽  
Ir Study

UVN2-negative chemically amplified resist optimization for x-ray mask fabrication

1999 ◽  
Author(s):  
Janet M. Rocque ◽  
Michael J. Lercel ◽  
Cameron J. Brooks ◽  
Richard W. Henry ◽  
Douglas E. Benoit
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Masahito Tanabe ◽  
Daisuke Inokuchi ◽  
Yuichi Fukushima ◽  
Yasuhiro Okumoto ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone
Sign in / Sign up

Export Citation Format

Share Document