Monte Carlo-fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio-frequency discharges for plasma etching
1992 ◽
Vol 10
(5)
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pp. 2179
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2001 ◽
Vol 16
(7)
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pp. 750-755
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1994 ◽
Vol 3
(2)
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pp. 190-205
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1999 ◽
Vol 54
(9)
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pp. 1335-1350
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Keyword(s):
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1999 ◽
Vol 38
(Part 1, No. 7B)
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pp. 4404-4415
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1982 ◽
Vol 2
(3)
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pp. 213-231
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