Monte Carlo-fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio-frequency discharges for plasma etching

Author(s):  
Timothy J. Sommerer
1997 ◽  
Vol 82 (5) ◽  
pp. 2060-2071 ◽  
Author(s):  
G. J. Nienhuis ◽  
W. J. Goedheer ◽  
E. A. G. Hamers ◽  
W. G. J. H. M. van Sark ◽  
J. Bezemer

1991 ◽  
Vol 59 (6) ◽  
pp. 638-640 ◽  
Author(s):  
Timothy J. Sommerer ◽  
Michael S. Barnes ◽  
John H. Keller ◽  
Michael J. McCaughey ◽  
Mark J. Kushner

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