Acid-diffusion effect on nanofabrication in chemical amplification resist

1992 ◽  
Vol 10 (6) ◽  
pp. 2615 ◽  
Author(s):  
Toshiyuki Yoshimura
Keyword(s):  
Diffusion Effect ◽  
Chemical Amplification ◽  
Acid Diffusion

The Effect of Hydrophilic Photoacid Generator on Acid Diffusion in Chemical Amplification Resists

2014 ◽  
Vol 14 (12) ◽  
pp. 9662-9664
Author(s):  
Ha Na Kang ◽  
Jin Hyuck Jung ◽  
Hyun Sang Joo ◽  
Dong Chul Seo ◽  
Haiwon Lee
Keyword(s):  
Chemical Amplification ◽  
Acid Diffusion ◽  
Photoacid Generator

Suppression of Acid Diffusion in Chemical Amplification Resists by Molecular Control of Base Matrix Polymers

1995 ◽  
Vol 34 (Part 1, No. 12B) ◽  
pp. 6786-6793 ◽  
Author(s):  
Toshiyuki Yoshimura ◽  
Hiroshi Shiraishi ◽  
Shinji Okazaki
Keyword(s):  
Molecular Control ◽  
Chemical Amplification ◽  
Acid Diffusion ◽  
Base Matrix

Determination of Acid Diffusion in Chemical Amplification Positive Deep-UV Resists

1991 ◽  
Vol 30 (Part 1, No. 11B) ◽  
pp. 3132-3137 ◽  
Author(s):  
Leo Schlegel ◽  
Takumi Ueno ◽  
Nobuaki Hayashi ◽  
Takao Iwayanagi
Keyword(s):  
Chemical Amplification ◽  
Acid Diffusion ◽  
Deep Uv

scholarly journals Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.

1994 ◽  
Vol 7 (3) ◽  
pp. 433-447 ◽  
Author(s):  
Hiroshi ITO ◽  
Greg BREYTA ◽  
Don HOFER ◽  
R. SOORIYAKUMARAN ◽  
Karen PETRILLO ◽  
...  
Keyword(s):  
Chemical Amplification ◽  
Stable Chemical ◽  
Positive Resist
Sign in / Sign up

Export Citation Format

Share Document