Determination of acid diffusion in chemical amplification positive deep ultraviolet resists

Leo Schlegel

doi:10.1116/1.585607

Determination of acid diffusion in chemical amplification positive deep ultraviolet resists

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585607 ◽

1991 ◽

Vol 9 (2) ◽

pp. 278 ◽

Cited By ~ 47

Author(s):

Leo Schlegel

Keyword(s):

Chemical Amplification ◽

Acid Diffusion ◽

Deep Ultraviolet

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Determination of Acid Diffusion in Chemical Amplification Positive Deep-UV Resists

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.3132 ◽

1991 ◽

Vol 30 (Part 1, No. 11B) ◽

pp. 3132-3137 ◽

Cited By ~ 20

Author(s):

Leo Schlegel ◽

Takumi Ueno ◽

Nobuaki Hayashi ◽

Takao Iwayanagi

Keyword(s):

Chemical Amplification ◽

Acid Diffusion ◽

Deep Uv

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Electrical determination of current injection and internal quantum efficiencies in AlGaN-based deep-ultraviolet light-emitting diodes

Optics Express ◽

10.1364/oe.25.00a639 ◽

2017 ◽

Vol 25 (16) ◽

pp. A639 ◽

Cited By ~ 20

Author(s):

Guo-Dong Hao ◽

Naoki Tamari ◽

Toshiyuki Obata ◽

Toru Kinoshita ◽

Shin-ichiro Inoue

Keyword(s):

Ultraviolet Light ◽

Light Emitting Diodes ◽

Current Injection ◽

Light Emitting ◽

Deep Ultraviolet ◽

Ultraviolet Light Emitting Diodes

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Electrochemical Determination of Nucleic Acid Diffusion Coefficients through Noncovalent Association of a Redox-Active Probe

The Journal of Physical Chemistry ◽

10.1021/j100030a021 ◽

1995 ◽

Vol 99 (30) ◽

pp. 11757-11763 ◽

Cited By ~ 28

Author(s):

Thomas W. Welch ◽

Amanda H. Corbett ◽

H. Holden Thorp

Keyword(s):

Nucleic Acid ◽

Diffusion Coefficients ◽

Electrochemical Determination ◽

Acid Diffusion ◽

Redox Active ◽

Active Probe

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Process control with chemical amplification resists using deep ultraviolet and x-ray radiation

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584075 ◽

1988 ◽

Vol 6 (6) ◽

pp. 2303 ◽

Cited By ~ 9

Author(s):

Daniel Seligson

Keyword(s):

Process Control ◽

X Ray ◽

Chemical Amplification ◽

Deep Ultraviolet

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Determination of acid diffusion rate in a chemically amplified resist with scanning tunneling microscope lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586632 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2597 ◽

Cited By ~ 13

Author(s):

F. Keith Perkins

Keyword(s):

Scanning Tunneling Microscope ◽

Diffusion Rate ◽

Scanning Tunneling ◽

Tunneling Microscope ◽

Acid Diffusion ◽

Chemically Amplified ◽

Chemically Amplified Resist

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Chemical amplification of the signal in ion-selective potentiometry: indirect determination of Al(III) and U(VI) by steady-state and flow-injection potentiometry using a copper ion-selective electrode

Analytica Chimica Acta ◽

10.1016/0003-2670(92)85088-n ◽

1992 ◽

Vol 259 (1) ◽

pp. 149-157 ◽

Cited By ~ 6

Author(s):

M. Neshkova ◽

E. Pancheva ◽

J. Fucsko ◽

G. Nagy ◽

E. Pungor

Keyword(s):

Steady State ◽

Flow Injection ◽

Copper Ion ◽

Ion Selective Electrode ◽

Selective Electrode ◽

Indirect Determination ◽

Chemical Amplification

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Acid-diffusion suppression in chemical amplification resists by controlling acid-diffusion channels in base matrix polymers

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588578 ◽

1996 ◽

Vol 14 (6) ◽

pp. 4216 ◽

Cited By ~ 7

Author(s):

Toshiyuki Yoshimura

Keyword(s):

Chemical Amplification ◽

Acid Diffusion ◽

Base Matrix

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Determination of Acid Diffusion Parameters and Proximity Effect Correction for Highly Dense0.15 µmFeatures on SAL-601

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.6562 ◽

1997 ◽

Vol 36 (Part 1, No. 10) ◽

pp. 6562-6571 ◽

Cited By ~ 7

Author(s):

Ioannis Raptis

Keyword(s):

Proximity Effect ◽

Acid Diffusion ◽

Diffusion Parameters ◽

Proximity Effect Correction

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A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-Ultraviolet Lithography: I. Limited Permeation of Si Compounds from Vapor Phase*

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.669 ◽

2000 ◽

Vol 39 (Part 1, No. 2A) ◽

pp. 669-674

Author(s):

Kazuyuki Sugita ◽

Masakuni Ikagawa ◽

Kieko Harada ◽

Masahito Kushida ◽

Kyoichi Saito

Keyword(s):

Vapor Phase ◽

Single Layer ◽

Ultraviolet Lithography ◽

Chemical Amplification ◽

Deep Ultraviolet

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The Effect of Hydrophilic Photoacid Generator on Acid Diffusion in Chemical Amplification Resists

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2014.10155 ◽

2014 ◽

Vol 14 (12) ◽

pp. 9662-9664

Author(s):

Ha Na Kang ◽

Jin Hyuck Jung ◽

Hyun Sang Joo ◽

Dong Chul Seo ◽

Haiwon Lee

Keyword(s):

Chemical Amplification ◽

Acid Diffusion ◽

Photoacid Generator

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