Electrical properties of nanometer-scale Si p+-n junctions fabricated by low energy Ga+ focused ion beam implantation

Author(s):  
A. J. Steckl
2014 ◽  
Vol 7 (11) ◽  
pp. 115201 ◽  
Author(s):  
Syuto Tamura ◽  
Godai Koike ◽  
Akira Komatsubara ◽  
Tokuyuki Teraji ◽  
Shinobu Onoda ◽  
...  

2004 ◽  
Vol 43 (No. 6A) ◽  
pp. L716-L718 ◽  
Author(s):  
Tomokazu Nishiyama ◽  
Eum-Mi Kim ◽  
Kazutoshi Numata ◽  
Kangsa Pak

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