Establishing the relationship between process, structure, and properties on titanium nitride films deposited by electron cyclotron resonance assisted reactive sputtering. II. A process model

1999 ◽  
Vol 17 (5) ◽  
pp. 2859-2868 ◽  
Author(s):  
Carl Carney ◽  
Delcie Durham
Keyword(s):  
Titanium Nitride ◽  
Cyclotron Resonance ◽  
Process Model ◽  
Electron Cyclotron Resonance ◽  
Reactive Sputtering ◽  
Electron Cyclotron ◽  
Structure And Properties ◽  
Process Structure ◽  
The Relationship

Long Electron Cyclotron Resonance Plasma Source for Reactive Sputtering

1996 ◽  
Vol 35 (Part 1, No. 10) ◽  
pp. 5495-5500 ◽  
Author(s):  
Toshiaki Yasui ◽  
Kiyotaka Nakase ◽  
Hirokazu Tahara ◽  
Takao Yoshikawa
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Reactive Sputtering ◽  
Plasma Source ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Ion Bombardment Effects on Boron Nitride Film Synthesis by Reactive Sputtering with Electron Cyclotron Resonance Plasmas

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4515-4519 ◽  
Author(s):  
Masayuki Wakatsuchi ◽  
Yoshiro Takaba ◽  
Kumiko \scshapeKanai ◽  
Yoshio Ueda ◽  
Masahiro Nishikawa
Keyword(s):  
Boron Nitride ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Ion Bombardment ◽  
Reactive Sputtering ◽  
Electron Cyclotron ◽  
Nitride Film ◽  
Film Synthesis
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