A Process Model and Complementary Experiments for the Electron Cyclotron Resonance (ECR) Technology: Application to Deposition and Etching. Phase II.

1996 ◽  
Author(s):  
M. Meyyappan ◽  
T. R. Govindan ◽  
F. deJong ◽  
R. C. Buggeln
Keyword(s):  
Phase Ii ◽  
Cyclotron Resonance ◽  
Process Model ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Technology Application

Anisotropic electron cyclotron resonance etching of tungsten films on GaAs

1994 ◽  
Vol 30 (1) ◽  
pp. 84-85 ◽  
Author(s):  
R.J. Shul ◽  
D.J. Rieger ◽  
C. Constantine ◽  
A.G. Baca ◽  
C. Barratt
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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