Optical and transport properties of amorphous and microcrystalline silicon films prepared by excimer laser assisted rf glow-discharge deposition

1998 ◽  
Vol 16 (2) ◽  
pp. 436-443 ◽  
Author(s):  
P. Roca i Cabarrocas ◽  
N. Layadi ◽  
M. Kunst ◽  
C. Clerc ◽  
H. Bernas
Keyword(s):  
Glow Discharge ◽  
Transport Properties ◽  
Excimer Laser ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge ◽  
Glow Discharge Deposition

Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Influence of Hydrogen Dilution on Properties of Silicon Films Prepared by D.C. Saddle-Field Glow-Discharge: Observation of Microcrystallinity

2003 ◽  
Vol 762 ◽  
Author(s):  
T. Allen ◽  
I. Milostnaya ◽  
D. Yeghikyan ◽  
K. Leong ◽  
F. Gaspari ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Gas Phase ◽  
Volume Fraction ◽  
Average Crystallite Size ◽  
Crystalline Volume Fraction ◽  
Microcrystalline Silicon ◽  
Silicon Thin Films ◽  
Hydrogen Dilution ◽  
Silane Concentration ◽  
Glow Discharge Deposition

AbstractIn the D.C. saddle field glow discharge deposition the transition from amorphous to microcrystalline silicon thin films occurs when the silane concentration in the gas phase drops below 10%. We report here the results of Raman spectroscopy, SEM, TEM, and HRTEM studies of the film morphology. We estimate the average crystallite size to be in the range of 5 to 7 nm and the crystalline volume fraction of 25 to 35%.

Saddle-Field Glow-Discharge Deposition of Amorphous Semiconductors

1996 ◽  
Vol 420 ◽  
Author(s):  
F. Gaspari ◽  
L. S. Sidhu ◽  
S. K. O'leary ◽  
S. Zukotynski
Keyword(s):  
Growth Rate ◽  
Glow Discharge ◽  
Significant Role ◽  
Mass Spectra ◽  
Film Surface ◽  
Amorphous Semiconductors ◽  
Glow Discharges ◽  
Rf Glow Discharge ◽  
Dc Saddle Field ◽  
Glow Discharge Deposition

AbstractWe present a dc saddle-field glow-discharge deposition procedure which combines the positive attributes of the conventional dc and rf glow-discharge techniques. Preliminary mass spectra analyses of both silane and methane glow-discharges demonstrates that ions constitute a significant fraction of the species reaching the film surface. Growth rate analyses suggest that ions play a significant role in the saddle-field glow-discharge deposition of amorphous semiconducting films.

Microscopic Studies of Dual Phase Amorphous/Microcrystalline Silicon Prepared by the Saddle-Field Glow Discharge Deposition Method with Hydrogen Dilution

2004 ◽  
Vol 10 (S02) ◽  
pp. 648-649
Author(s):  
Tatiana Allen ◽  
Davit Yeghikyan ◽  
Keith Leong ◽  
Nazir Kherani ◽  
William Roes ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Dual Phase ◽  
Deposition Method ◽  
Microcrystalline Silicon ◽  
Hydrogen Dilution ◽  
Microscopic Studies ◽  
Glow Discharge Deposition

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Insituinvestigation of the growth of rf glow‐discharge deposited amorphous germanium and silicon films

1987 ◽  
Vol 61 (7) ◽  
pp. 2501-2508 ◽  
Author(s):  
A. M. Antoine ◽  
B. Drevillon ◽  
P. Roca i Cabarrocas
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Amorphous Germanium ◽  
Rf Glow Discharge
Sign in / Sign up

Export Citation Format

Share Document