Insituinvestigation of the growth of rf glow‐discharge deposited amorphous germanium and silicon films

1987 ◽  
Vol 61 (7) ◽  
pp. 2501-2508 ◽  
Author(s):  
A. M. Antoine ◽  
B. Drevillon ◽  
P. Roca i Cabarrocas
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Amorphous Germanium ◽  
Rf Glow Discharge

Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Efficient Boron Incorporation in Hydrogenated Amorphous Silicon Films by a Novel Combination of RF Glow Discharge Technique and Heated Filament

1995 ◽  
Vol 34 (Part 1, No. 10) ◽  
pp. 5743-5750 ◽  
Author(s):  
S. Chattopadhyay ◽  
Debabrata Das ◽  
S. N. Sharma ◽  
A K. Barua ◽  
Ratnabali Banerjee ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Rf Glow Discharge ◽  
Hydrogenated Amorphous ◽  
Heated Filament

Cowparison Studies of Hydrogenated Amorphous Silicon Films Prepared From Silane-Hydrogen and Silmne-Helium Mixtures

1986 ◽  
Vol 70 ◽  
Author(s):  
R. I. Patel ◽  
D. J. Olsen ◽  
J. R. Shirck ◽  
N. T. Tran
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Optical Emission ◽  
Gas Mixtures ◽  
Silicon Films ◽  
Helium Mixtures ◽  
Rf Glow Discharge ◽  
Powder Formation ◽  
Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous silicon films were produced from silane/hydrogen and silane/helium gas mixtures by RF glow discharge. We examined the optical and electrical properties of films produced with these gas mixtures, at various RF power levels and silane fractions. Film quality was analyzed by measuring the dark and photoconductivity, optical band gap, and activation energy. Optical emission spectroscopy was also used as a diagnostic tool for studying the plasma during glow discharge depositions. Experimental results indicate that amorphous silicon films made from silane/helium mixtures exhibit improved optoelectronic properties, higher deposition rates, and higher emission intensity ratios (ISiH/IH) as compared to films produced from silane/hydrogen mixtures. In preparing films from silane/helium mixtures, the onset of dust/powder formation occurs at considerably higher RF powers as compared to silane/hydrogen, thus making this approach an attractive commercial option for depositing films at high rates.

Microanalysis of amorphous semiconductor films

1978 ◽  
Vol 36 (1) ◽  
pp. 534-535 ◽  
Author(s):  
B. Schröder ◽  
J. Geiger ◽  
H.W. Müller
Keyword(s):  
Glow Discharge ◽  
Energy Loss ◽  
Amorphous Silicon ◽  
Amorphous Semiconductor ◽  
Amorphous Semiconductors ◽  
Silicon Films ◽  
Semiconductor Films ◽  
Analytical Test ◽  
Infrared Spectral ◽  
Rf Glow Discharge

In a previous paper /l/ it has been pointed out that electron energy loss spectroscopy in the infrared spectral region is a very sensitive tool for the study of structure and composition of thin films. Here as a further example the energy loss study of amorphous silicon films is presented. In the case of amorphous semiconductors where most of the optical and electrical properties are still strongly influenced by impurities an analytical test is substantial.Silicon films have been investigated which have been prepared by different methods and under different conditions: by evaporation, by decomposition of silane (SiH4) in a rf glow discharge and by sputtering. The influence of the substrate temperature has been studied for films produced by silane decomposition.Fig. 1 shows a typical spectrum of amorphous silicon prepared by the glow discharge method obtained by 30 keV electrons with a resolution of 3 to 4 meV.

Current-voltage characteristics of aluminium nitride films formed by RF glow discharge

1980 ◽  
Vol 13 (6) ◽  
pp. L101-L105 ◽  
Author(s):  
D Mangalaraj ◽  
M Radhakrishnan ◽  
C Balasubramanian ◽  
A R Kasilingam
Keyword(s):  
Glow Discharge ◽  
Aluminium Nitride ◽  
Current Voltage ◽  
Rf Glow Discharge ◽  
Current Voltage Characteristics
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