Real‐time feedback for sidewall profile control in reactive ion etching

B. Rashap; J. Freudenberg; M. Elta

doi:10.1116/1.579770

Real‐time feedback for sidewall profile control in reactive ion etching

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579770 ◽

1995 ◽

Vol 13 (3) ◽

pp. 1792-1796 ◽

Cited By ~ 10

Author(s):

B. Rashap ◽

J. Freudenberg ◽

M. Elta

Keyword(s):

Real Time ◽

Reactive Ion Etching ◽

Ion Etching ◽

Profile Control

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Neural-Network-Based Sensor Fusion of Optical Emission and Mass Spectroscopy Data for Real-Time Fault Detection in Reactive Ion Etching

IEEE Transactions on Industrial Electronics ◽

10.1109/tie.2005.851663 ◽

2005 ◽

Vol 52 (4) ◽

pp. 1063-1072 ◽

Cited By ~ 27

Author(s):

S.J. Hong ◽

G.S. May

Keyword(s):

Neural Network ◽

Fault Detection ◽

Real Time ◽

Sensor Fusion ◽

Mass Spectroscopy ◽

Reactive Ion Etching ◽

Optical Emission ◽

Spectroscopy Data ◽

Ion Etching

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Real-time control of reactive ion etching: identification and disturbance rejection

Proceedings of 32nd IEEE Conference on Decision and Control ◽

10.1109/cdc.1993.325839 ◽

2002 ◽

Cited By ~ 6

Author(s):

B.A. Rashap ◽

P.P. Khargonekar ◽

J.W. Grizzle ◽

M.E. Elta ◽

J.S. Freudenberg ◽

...

Keyword(s):

Real Time ◽

Disturbance Rejection ◽

Reactive Ion Etching ◽

Real Time Control ◽

Ion Etching ◽

Time Control

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NbN edge junction fabrication: edge profile control by reactive ion etching

IEEE Transactions on Magnetics ◽

10.1109/20.92520 ◽

1989 ◽

Vol 25 (2) ◽

pp. 1239-1242 ◽

Cited By ~ 5

Author(s):

X.F. Meng ◽

R.S. Amos ◽

A.W. Lichtenberger ◽

R.J. Mattauch ◽

M.J. Feldman

Keyword(s):

Reactive Ion Etching ◽

Ion Etching ◽

Profile Control ◽

Edge Profile

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Integrated real-time and run-to-run control of etch depth in reactive ion etching

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/66.554497 ◽

1997 ◽

Vol 10 (1) ◽

pp. 121-130 ◽

Cited By ~ 40

Author(s):

M. Hankinson ◽

T. Vincent ◽

K.B. Irani ◽

P.P. Khargonekar

Keyword(s):

Real Time ◽

Reactive Ion Etching ◽

Etch Depth ◽

Ion Etching

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Nanopattern Profile Control Technology Using Reactive Ion Etching for 100 GB Optical Disc Mastering

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.1414 ◽

2006 ◽

Vol 45 (2B) ◽

pp. 1414-1418 ◽

Cited By ~ 3

Author(s):

Megumi Fujimura ◽

Yasuo Hosoda ◽

Masahiro Katsumura ◽

Masaki Kobayashi ◽

Hiroaki Kitahara ◽

...

Keyword(s):

Reactive Ion Etching ◽

Control Technology ◽

Optical Disc ◽

Ion Etching ◽

Profile Control

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Real-time control of reactive ion etching using neural networks

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/66.892633 ◽

2000 ◽

Vol 13 (4) ◽

pp. 469-480 ◽

Cited By ~ 21

Author(s):

D. Stokes ◽

G.S. May

Keyword(s):

Neural Networks ◽

Real Time ◽

Reactive Ion Etching ◽

Real Time Control ◽

Ion Etching ◽

Time Control

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Real-time feedback control of reactive ion etching using neural networks

Proceedings of International Conference on Neural Networks (ICNN'96) ◽

10.1109/icnn.1996.549215 ◽

2002 ◽

Cited By ~ 1

Author(s):

T. Kim ◽

D. Stokes ◽

G. May

Keyword(s):

Neural Networks ◽

Feedback Control ◽

Real Time ◽

Reactive Ion Etching ◽

Ion Etching

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Real-time control of reactive ion etching using neural networks

Proceedings of the 1997 American Control Conference (Cat. No.97CH36041) ◽

10.1109/acc.1997.610845 ◽

1997 ◽

Cited By ~ 5

Author(s):

D. Stokes ◽

G. May

Keyword(s):

Neural Networks ◽

Real Time ◽

Reactive Ion Etching ◽

Real Time Control ◽

Ion Etching ◽

Time Control

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Deep-submicron trench profile control using a magnetron enhanced reactive ion etching system for shallow trench isolation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581177 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1502-1508 ◽

Cited By ~ 10

Author(s):

Chung-Kyu Yeon ◽

Hyuk-Joon You

Keyword(s):

Reactive Ion Etching ◽

Deep Submicron ◽

Ion Etching ◽

Shallow Trench Isolation ◽

Profile Control ◽

Trench Isolation ◽

Etching System

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Sensor systems for real-time feedback control of reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588499 ◽

1996 ◽

Vol 14 (1) ◽

pp. 483 ◽

Cited By ~ 23

Author(s):

T. E. Benson

Keyword(s):

Feedback Control ◽

Real Time ◽

Reactive Ion Etching ◽

Sensor Systems ◽

Ion Etching

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