Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

C. R. Eddy; B. D. Sartwell

doi:10.1116/1.579646

Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579646 ◽

1995 ◽

Vol 13 (4) ◽

pp. 2018-2022 ◽

Cited By ~ 15

Author(s):

C. R. Eddy ◽

B. D. Sartwell

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Microwave

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Boron nitride thin film deposition using electron cyclotron resonance microwave plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578514 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1863-1869 ◽

Cited By ~ 1

Author(s):

S. M. Gorbatkin ◽

R. F. Burgie ◽

W. C. Oliver ◽

J. C. Barbour ◽

T. M. Mayer ◽

...

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Microwave Plasmas ◽

Resonance Microwave

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Diamond thin film growth on silicon at temperatures between 500 and 600 °C using an electron cyclotron resonance microwave plasma source

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90129-k ◽

1991 ◽

Vol 48 (1) ◽

pp. 69-79 ◽

Cited By ~ 27

Author(s):

C.R. Eddy ◽

B.D. Sartwell ◽

D.L. Youchison

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Growth ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Thin Film Growth ◽

Diamond Thin Film ◽

Resonance Microwave

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Hard boron oxide thin‐film deposition using electron cyclotron resonance microwave plasmas

Applied Physics Letters ◽

10.1063/1.112598 ◽

1994 ◽

Vol 65 (21) ◽

pp. 2672-2674 ◽

Cited By ~ 30

Author(s):

S. M. Gorbatkin ◽

R. L. Rhoades ◽

T. Y. Tsui ◽

W. C. Oliver

Keyword(s):

Thin Film ◽

Boron Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Oxide Thin Film ◽

Microwave Plasmas ◽

Resonance Microwave

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Electron cyclotron resonance microwave discharges for etching and thin‐film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575815 ◽

1989 ◽

Vol 7 (3) ◽

pp. 883-893 ◽

Cited By ~ 315

Author(s):

Jes Asmussen

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Microwave Discharges ◽

Resonance Microwave

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Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1997.604953 ◽

2002 ◽

Author(s):

E. Koretzky ◽

S.P. Kuo ◽

S.C. Kuo

Keyword(s):

Thin Film ◽

Experimental Study ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Plasma

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Preparation of Diamond-Like carbon Films in methane by Electron Cyclotron Resonance Microwave Plasma Source Ion Implantation

Chinese Physics Letters ◽

10.1088/0256-307x/20/5/329 ◽

2003 ◽

Vol 20 (5) ◽

pp. 692-695 ◽

Cited By ~ 10

Author(s):

Li Xin ◽

Tang Zhen-An ◽

Ma Guo-Ja ◽

Wu Zhi-Meng ◽

Deng Xin-Lu

Keyword(s):

Ion Implantation ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Plasma Source Ion Implantation ◽

Resonance Microwave

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Characteristics of a large diameter reactive ion beam generated by an electron cyclotron resonance microwave plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1347051 ◽

2001 ◽

Vol 19 (2) ◽

pp. 539-546 ◽

Cited By ~ 4

Author(s):

St. Geisler ◽

A. Brockhaus ◽

J. Engemann

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Ion Beam ◽

Large Diameter ◽

Plasma Source ◽

Electron Cyclotron ◽

Resonance Microwave

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Cu deposition using a permanent magnet electron cyclotron resonance microwave plasma source

10.2172/10178692 ◽

1994 ◽

Author(s):

L.A. Berry ◽

S.M. Gorbatkin ◽

R.L. Rhoades

Keyword(s):

Permanent Magnet ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Resonance Microwave

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Cu deposition using a permanent magnet electron cyclotron resonance microwave plasma source

Thin Solid Films ◽

10.1016/0040-6090(94)90352-2 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 382-385 ◽

Cited By ~ 4

Author(s):

Lee A. Berry ◽

S.M. Gorbatkin ◽

R.L. Rhoades

Keyword(s):

Permanent Magnet ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Resonance Microwave

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Synthesis of Boron Nitride Films Using Electron–Cyclotron Resonance Microwave Plasma and an H2–BF3–N2–Ar–He Gas System

Chemical Vapor Deposition ◽

10.1002/cvde.200306241 ◽

2003 ◽

Vol 9 (4) ◽

pp. 181-186 ◽

Cited By ~ 5

Author(s):

C.-Y. Chan ◽

W. Zhang ◽

K.-M. Chan ◽

I. Bello ◽

S.-T. Lee

Keyword(s):

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Gas System ◽

Boron Nitride Films ◽

Resonance Microwave

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