Characteristics of a large diameter reactive ion beam generated by an electron cyclotron resonance microwave plasma source

St. Geisler; A. Brockhaus; J. Engemann

doi:10.1116/1.1347051

Characteristics of a large diameter reactive ion beam generated by an electron cyclotron resonance microwave plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1347051 ◽

2001 ◽

Vol 19 (2) ◽

pp. 539-546 ◽

Cited By ~ 4

Author(s):

St. Geisler ◽

A. Brockhaus ◽

J. Engemann

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Ion Beam ◽

Large Diameter ◽

Plasma Source ◽

Electron Cyclotron ◽

Resonance Microwave

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Preparation of Diamond-Like carbon Films in methane by Electron Cyclotron Resonance Microwave Plasma Source Ion Implantation

Chinese Physics Letters ◽

10.1088/0256-307x/20/5/329 ◽

2003 ◽

Vol 20 (5) ◽

pp. 692-695 ◽

Cited By ~ 10

Author(s):

Li Xin ◽

Tang Zhen-An ◽

Ma Guo-Ja ◽

Wu Zhi-Meng ◽

Deng Xin-Lu

Keyword(s):

Ion Implantation ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Plasma Source Ion Implantation ◽

Resonance Microwave

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Cu deposition using a permanent magnet electron cyclotron resonance microwave plasma source

10.2172/10178692 ◽

1994 ◽

Author(s):

L.A. Berry ◽

S.M. Gorbatkin ◽

R.L. Rhoades

Keyword(s):

Permanent Magnet ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Resonance Microwave

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Cu deposition using a permanent magnet electron cyclotron resonance microwave plasma source

Thin Solid Films ◽

10.1016/0040-6090(94)90352-2 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 382-385 ◽

Cited By ~ 4

Author(s):

Lee A. Berry ◽

S.M. Gorbatkin ◽

R.L. Rhoades

Keyword(s):

Permanent Magnet ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Resonance Microwave

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Diamond thin film growth on silicon at temperatures between 500 and 600 °C using an electron cyclotron resonance microwave plasma source

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90129-k ◽

1991 ◽

Vol 48 (1) ◽

pp. 69-79 ◽

Cited By ~ 27

Author(s):

C.R. Eddy ◽

B.D. Sartwell ◽

D.L. Youchison

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Growth ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Thin Film Growth ◽

Diamond Thin Film ◽

Resonance Microwave

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Characterization of a multipolar electron cyclotron resonance microwave plasma source

10.1109/plasma.1989.166148 ◽

2003 ◽

Author(s):

J. Hopwood ◽

R. Wagner ◽

D.K. Reinhard ◽

J. Asmusen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Resonance Microwave

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Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579646 ◽

1995 ◽

Vol 13 (4) ◽

pp. 2018-2022 ◽

Cited By ~ 15

Author(s):

C. R. Eddy ◽

B. D. Sartwell

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Microwave

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Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4393 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4393-4396 ◽

Cited By ~ 3

Author(s):

Yasunori Ohtsu ◽

Keiichi Mori ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Distribution Functions ◽

Electron Cyclotron ◽

Energy Distribution Functions ◽

Resonance Microwave

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Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580699 ◽

1997 ◽

Vol 15 (3) ◽

pp. 647-653 ◽

Cited By ~ 6

Author(s):

S. F. Webb ◽

G. A. Gaddy ◽

Rik Blumenthal

Keyword(s):

Molecular Species ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Resonance Microwave

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Kinetic modeling of microscopic processes during electron cyclotron resonance microwave plasma‐assisted molecular beam epitaxial growth of GaN/GaAs‐based heterostructures

Applied Physics Letters ◽

10.1063/1.115682 ◽

1996 ◽

Vol 68 (11) ◽

pp. 1510-1512 ◽

Cited By ~ 20

Author(s):

Z. Z. Bandić ◽

R. J. Hauenstein ◽

M. L. O’Steen ◽

T. C. McGill

Keyword(s):

Epitaxial Growth ◽

Kinetic Modeling ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Molecular Beam Epitaxial ◽

Molecular Beam Epitaxial Growth ◽

Resonance Microwave

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New high‐rate sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror

Applied Physics Letters ◽

10.1063/1.101310 ◽

1989 ◽

Vol 54 (17) ◽

pp. 1645-1647 ◽

Cited By ~ 13

Author(s):

Morito Matsuoka ◽

Ken’ichi Ono

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

High Rate ◽

Resonance Microwave

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