Electron cyclotron resonance microwave discharges for etching and thin‐film deposition

Jes Asmussen

doi:10.1116/1.575815

Electron cyclotron resonance microwave discharges for etching and thin‐film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575815 ◽

1989 ◽

Vol 7 (3) ◽

pp. 883-893 ◽

Cited By ~ 315

Author(s):

Jes Asmussen

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Microwave Discharges ◽

Resonance Microwave

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Boron nitride thin film deposition using electron cyclotron resonance microwave plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578514 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1863-1869 ◽

Cited By ~ 1

Author(s):

S. M. Gorbatkin ◽

R. F. Burgie ◽

W. C. Oliver ◽

J. C. Barbour ◽

T. M. Mayer ◽

...

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Microwave Plasmas ◽

Resonance Microwave

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Hard boron oxide thin‐film deposition using electron cyclotron resonance microwave plasmas

Applied Physics Letters ◽

10.1063/1.112598 ◽

1994 ◽

Vol 65 (21) ◽

pp. 2672-2674 ◽

Cited By ~ 30

Author(s):

S. M. Gorbatkin ◽

R. L. Rhoades ◽

T. Y. Tsui ◽

W. C. Oliver

Keyword(s):

Thin Film ◽

Boron Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Oxide Thin Film ◽

Microwave Plasmas ◽

Resonance Microwave

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Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579646 ◽

1995 ◽

Vol 13 (4) ◽

pp. 2018-2022 ◽

Cited By ~ 15

Author(s):

C. R. Eddy ◽

B. D. Sartwell

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Microwave

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Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1997.604953 ◽

2002 ◽

Author(s):

E. Koretzky ◽

S.P. Kuo ◽

S.C. Kuo

Keyword(s):

Thin Film ◽

Experimental Study ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Plasma

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Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1996.550637 ◽

2002 ◽

Author(s):

E. Koretzky ◽

S.P. Kuo ◽

S.C. Kuo

Keyword(s):

Thin Film ◽

Experimental Study ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Plasma

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Silicon carbon alloy thin film depositions using electron cyclotron resonance microwave plasmas

10.1109/pvsc.1990.111873 ◽

2002 ◽

Author(s):

Y.H. Shing ◽

F.S. Pool

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Alloy Thin Film ◽

Microwave Plasmas ◽

Silicon Carbon ◽

Resonance Microwave

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Comparison of circular TM/sub 01/ and TM/sub 11/ modes generated electron cyclotron resonance microwave discharges-a Monte Carlo simulation study

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science (Cat. No.00CH37087) ◽

10.1109/plasma.2000.854836 ◽

2002 ◽

Author(s):

S.S. Kuo

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Simulation Study ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Monte Carlo Simulation Study ◽

Microwave Discharges ◽

Resonance Microwave

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Electron cyclotron resonance microwave ion sources for thin film processing

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(91)95114-s ◽

1991 ◽

Vol 56-57 ◽

pp. 1133-1137 ◽

Cited By ~ 5

Author(s):

L.A. Berry ◽

S.M. Gorbatkin

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Sources ◽

Film Processing ◽

Resonance Microwave ◽

Thin Film Processing

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A New Method for Thin Film Deposition—Faced Microwave Electron Cyclotron Resonance Plasma Sources Enhanced Direct-Current Magnetron Sputtering

Chinese Physics Letters ◽

10.1088/0256-307x/17/8/015 ◽

2000 ◽

Vol 17 (8) ◽

pp. 586-588 ◽

Cited By ~ 6

Author(s):

Xu Jun ◽

Ma Teng-Cai ◽

Lu Wen-Qi ◽

Xia Yuan-Liang ◽

Deng Xin-Lu

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Film Deposition ◽

Plasma Sources ◽

Direct Current Magnetron Sputtering ◽

Resonance Plasma

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Diamond thin film growth on silicon at temperatures between 500 and 600 °C using an electron cyclotron resonance microwave plasma source

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90129-k ◽

1991 ◽

Vol 48 (1) ◽

pp. 69-79 ◽

Cited By ~ 27

Author(s):

C.R. Eddy ◽

B.D. Sartwell ◽

D.L. Youchison

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Growth ◽

Microwave Plasma ◽

Plasma Source ◽

Electron Cyclotron ◽

Thin Film Growth ◽

Diamond Thin Film ◽

Resonance Microwave

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