Synthesis of Boron Nitride Films Using Electron–Cyclotron Resonance Microwave Plasma and an H2–BF3–N2–Ar–He Gas System

C.-Y. Chan; W. Zhang; K.-M. Chan; I. Bello; S.-T. Lee

doi:10.1002/cvde.200306241

Synthesis of Boron Nitride Films Using Electron–Cyclotron Resonance Microwave Plasma and an H2–BF3–N2–Ar–He Gas System

Chemical Vapor Deposition ◽

10.1002/cvde.200306241 ◽

2003 ◽

Vol 9 (4) ◽

pp. 181-186 ◽

Cited By ~ 5

Author(s):

C.-Y. Chan ◽

W. Zhang ◽

K.-M. Chan ◽

I. Bello ◽

S.-T. Lee

Keyword(s):

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Gas System ◽

Boron Nitride Films ◽

Resonance Microwave

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Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579646 ◽

1995 ◽

Vol 13 (4) ◽

pp. 2018-2022 ◽

Cited By ~ 15

Author(s):

C. R. Eddy ◽

B. D. Sartwell

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Microwave

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Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4393 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4393-4396 ◽

Cited By ~ 3

Author(s):

Yasunori Ohtsu ◽

Keiichi Mori ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Distribution Functions ◽

Electron Cyclotron ◽

Energy Distribution Functions ◽

Resonance Microwave

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Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580699 ◽

1997 ◽

Vol 15 (3) ◽

pp. 647-653 ◽

Cited By ~ 6

Author(s):

S. F. Webb ◽

G. A. Gaddy ◽

Rik Blumenthal

Keyword(s):

Molecular Species ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Resonance Microwave

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Kinetic modeling of microscopic processes during electron cyclotron resonance microwave plasma‐assisted molecular beam epitaxial growth of GaN/GaAs‐based heterostructures

Applied Physics Letters ◽

10.1063/1.115682 ◽

1996 ◽

Vol 68 (11) ◽

pp. 1510-1512 ◽

Cited By ~ 20

Author(s):

Z. Z. Bandić ◽

R. J. Hauenstein ◽

M. L. O’Steen ◽

T. C. McGill

Keyword(s):

Epitaxial Growth ◽

Kinetic Modeling ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Molecular Beam Epitaxial ◽

Molecular Beam Epitaxial Growth ◽

Resonance Microwave

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New high‐rate sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror

Applied Physics Letters ◽

10.1063/1.101310 ◽

1989 ◽

Vol 54 (17) ◽

pp. 1645-1647 ◽

Cited By ~ 13

Author(s):

Morito Matsuoka ◽

Ken’ichi Ono

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

High Rate ◽

Resonance Microwave

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Electron-Cyclotron-Resonance Microwave Plasma Oxidation of Er1Ba2Cu3OySuperconductive Ceramics

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.l411 ◽

1988 ◽

Vol 27 (Part 2, No. 3) ◽

pp. L411-L413 ◽

Cited By ~ 5

Author(s):

Shoichiro Minomo ◽

Michio Taniguchi ◽

Yuji Ishida ◽

Masato Sugiyo ◽

Tetsuro Takahashi ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Resonance Microwave

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Electron cyclotron resonance plasma assisted sputter deposition of boron nitride films

Applied Physics Letters ◽

10.1063/1.118332 ◽

1997 ◽

Vol 70 (5) ◽

pp. 628-630 ◽

Cited By ~ 8

Author(s):

G. Mohan Rao ◽

S. B. Krupanidhi

Keyword(s):

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Sputter Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Boron Nitride Films ◽

Resonance Plasma

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Poly‐Si etching using electron cyclotron resonance microwave plasma sources with multipole confinement

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578242 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1295-1302 ◽

Cited By ~ 4

Author(s):

S. M. Gorbatkin ◽

L. A. Berry ◽

John Swyers

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Plasma Sources ◽

Resonance Microwave

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Low temperature deposition of SiN[sub x]:H using SiH[sub 4]–N[sub 2] or SiH[sub 4]–NH[sub 3] distributed electron cyclotron resonance microwave plasma

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589579 ◽

1997 ◽

Vol 15 (6) ◽

pp. 1919 ◽

Cited By ~ 12

Author(s):

F. Delmotte

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Microwave

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Electron cyclotron resonance microwave plasma neutralizer for ion thruster systems

The 31st IEEE International Conference on Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. ◽

10.1109/plasma.2004.1339869 ◽

2004 ◽

Author(s):

Y. Hidaka ◽

R.M. Gilgenbach ◽

M.C. Jones ◽

Y.Y. Lau ◽

W.D. Getty

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Ion Thruster ◽

Resonance Microwave

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