Computer calculation of neutral–radical densities in a CF4 electron cyclotron resonance plasma processing system

1993 ◽  
Vol 11 (4) ◽  
pp. 1136-1141 ◽  
Author(s):  
K. A. Ashtiani ◽  
J. L. Shohet ◽  
R. E. P. Harvey
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Computer Calculation ◽  
Plasma Processing ◽  
Processing System ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Neutral Radical ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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