Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing

J.B. Friedmann; J.L. Shohet; R. Mau; N. Hershkowitz; S. Bisgaard;  Shawming Ma; J.P. McVittie

doi:10.1109/66.554504

Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processing

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/66.554504 ◽

1997 ◽

Vol 10 (1) ◽

pp. 154-166 ◽

Cited By ~ 15

Author(s):

J.B. Friedmann ◽

J.L. Shohet ◽

R. Mau ◽

N. Hershkowitz ◽

S. Bisgaard ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Parameter ◽

Plasma Processing ◽

Electron Cyclotron ◽

Parameter Dependence ◽

Electron Cyclotron Resonance Plasma ◽

Thin Oxide ◽

Wafer Charging ◽

Resonance Plasma

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SiGe pMOSFET's with gate oxide fabricated by microwave electron cyclotron resonance plasma processing

IEEE Electron Device Letters ◽

10.1109/55.320982 ◽

1994 ◽

Vol 15 (10) ◽

pp. 402-405 ◽

Cited By ~ 43

Author(s):

P.W. Li ◽

E.S. Yang ◽

Y.F. Yang ◽

J.O. Chu ◽

B.S. Meyerson

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Processing ◽

Gate Oxide ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pulsed Plasma Processing for Reduction of Profile Distortion Induced by Charge Buildup in Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.2450 ◽

1996 ◽

Vol 35 (Part 1, No. 4B) ◽

pp. 2450-2455 ◽

Cited By ~ 43

Author(s):

Nobuo Fujiwara ◽

Takahiro Maruyama ◽

Masahiro Yoneda

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Processing ◽

Electron Cyclotron ◽

Pulsed Plasma ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Damage introduction in GaAs/AlGaAs and InGaAs/InP heterojunction bipolar transistor structures during electron cyclotron resonance plasma processing

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578422 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1768-1771 ◽

Cited By ~ 14

Author(s):

F. Ren ◽

T. R. Fullowan ◽

S. J. Pearton ◽

J. R. Lothian ◽

R. Esagui ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Processing ◽

Bipolar Transistor ◽

Electron Cyclotron ◽

Heterojunction Bipolar Transistor ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Thin‐oxide charging damage to microelectronic test structures in an electron‐cyclotron‐resonance plasma

Applied Physics Letters ◽

10.1063/1.115360 ◽

1995 ◽

Vol 67 (25) ◽

pp. 3718-3720 ◽

Cited By ~ 11

Author(s):

J. B. Friedmann ◽

J. L. Shohet ◽

J. P. McVittie ◽

S. M. Ma

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Thin Oxide ◽

Resonance Plasma

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Thin-Oxide Charging Damage to Microelectronic Test Structures in an Electron-Cyclotron-Resonance Plasma

10.1109/ppid.1996.715235 ◽

2005 ◽

Author(s):

J.B. Friedmann ◽

J.L. Shohet ◽

J.P. McVitie ◽

S.M. Ma

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Thin Oxide ◽

Resonance Plasma

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Computer calculation of neutral–radical densities in a CF4 electron cyclotron resonance plasma processing system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578454 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1136-1141 ◽

Cited By ~ 5

Author(s):

K. A. Ashtiani ◽

J. L. Shohet ◽

R. E. P. Harvey

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Computer Calculation ◽

Plasma Processing ◽

Processing System ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Neutral Radical ◽

Resonance Plasma

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Growth and properties of microcrystalline germanium–carbide alloys grown using electron cyclotron resonance plasma processing

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(00)00091-0 ◽

2000 ◽

Vol 270 (1-3) ◽

pp. 255-259 ◽

Cited By ~ 37

Author(s):

Jason T. Herrold ◽

Vikram L. Dalal

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Processing ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Germanium Carbide ◽

Resonance Plasma

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In situmonitoring of electron cyclotron resonance plasma processing of GaAs surfaces by optical reflection spectroscopy

Applied Physics Letters ◽

10.1063/1.111484 ◽

1994 ◽

Vol 64 (20) ◽

pp. 2661-2663 ◽

Cited By ~ 8

Author(s):

L. M. Weegels ◽

T. Saitoh ◽

H. Oohashi ◽

H. Kanbe

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Processing ◽

Electron Cyclotron ◽

Reflection Spectroscopy ◽

Electron Cyclotron Resonance Plasma ◽

Optical Reflection ◽

Resonance Plasma

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Plasma structures in an electron cyclotron resonance plasma processing device

Journal of Applied Physics ◽

10.1063/1.349139 ◽

1991 ◽

Vol 70 (8) ◽

pp. 4165-4171 ◽

Cited By ~ 7

Author(s):

Satoru Iizuka ◽

Noriyoshi Sato

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Processing ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Processing Device ◽

Resonance Plasma

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Comparison of damage and Si oxidation kinetics resulting from electron cyclotron resonance and distributed electron cyclotron resonance plasma processing

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588356 ◽

1995 ◽

Vol 13 (2) ◽

pp. 227 ◽

Cited By ~ 5

Author(s):

Y. Z. Hu

Keyword(s):

Oxidation Kinetics ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Processing ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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