Composition, structural, and electrical properties of fluorinated silicon–nitride thin films grown by remote plasma-enhanced chemical-vapor deposition from SiF[sub 4]/NH[sub 3] mixtures

Author(s):  
J. Fandiño ◽  
A. Ortiz ◽  
L. Rodrı́guez-Fernandez ◽  
J. C. Alonso
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