Composition, structural, and electrical properties of fluorinated silicon–nitride thin films grown by remote plasma-enhanced chemical-vapor deposition from SiF[sub 4]/NH[sub 3] mixtures
2004 ◽
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pp. 570
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1999 ◽
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pp. 1982-1986
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Keyword(s):
2017 ◽
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pp. 222-225
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1993 ◽
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pp. 854-857
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2010 ◽
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pp. 1338-1343
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