A large aluminum alloy molecular beam epitaxy chamber with an ultimate pressure of 7.5×10−12 Torr

1985 ◽  
Vol 3 (6) ◽  
pp. 2200-2204 ◽  
Author(s):  
J. R. Chen ◽  
K. Narushima ◽  
M. Miyamoto ◽  
H. Ishimaru
Keyword(s):  
Aluminum Alloy ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Ultimate Pressure ◽  
Molecular Beam Epitaxy Chamber

In-Situ Selective Area Etching of GaAs in Metalorganic Molecular Beam Epitaxy Chamber using Trisdimethylaminoarsenic

1996 ◽  
Vol 35 (Part 1, No. 7) ◽  
pp. 3814-3818 ◽  
Author(s):  
Toshihiko Hayashi ◽  
Hajime Asahi ◽  
Kazuhiko Yamamoto ◽  
Ken-ichi Hidaka ◽  
Shun-ichi Gonda
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Selective Area ◽  
Metalorganic Molecular Beam Epitaxy ◽  
Molecular Beam Epitaxy Chamber

scholarly journals Fast atom diffraction inside a molecular beam epitaxy chamber, a rich combination

2017 ◽  
Vol 391 ◽  
pp. 53-58 ◽  
Author(s):  
M. Debiossac ◽  
P. Atkinson ◽  
A. Zugarramurdi ◽  
M. Eddrief ◽  
F. Finocchi ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Molecular Beam Epitaxy Chamber

Aluminum alloy ultrahigh vacuum system for molecular beam epitaxy

1986 ◽  
Vol 4 (6) ◽  
pp. 2515-2519 ◽  
Author(s):  
M. Miyamoto ◽  
Y. Sumi ◽  
S. Komaki ◽  
K. Narushima ◽  
H. Ishimaru
Keyword(s):  
Aluminum Alloy ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Ultrahigh Vacuum ◽  
Vacuum System
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