Process control with optical emission spectroscopy in triode ion plating

K. Salmenoja; A. S. Korhonen; M. S. Sulonen

doi:10.1116/1.572882

Process control with optical emission spectroscopy in triode ion plating

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.572882 ◽

1985 ◽

Vol 3 (6) ◽

pp. 2364-2367 ◽

Cited By ~ 14

Author(s):

K. Salmenoja ◽

A. S. Korhonen ◽

M. S. Sulonen

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating

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The use of optical emission spectroscopy for process control in triode ion plating with ZrN

Vacuum ◽

10.1016/0042-207x(86)90265-4 ◽

1986 ◽

Vol 36 (1-3) ◽

pp. 33-35 ◽

Cited By ~ 15

Author(s):

K Salmenoja ◽

AS Korhonen

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating

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Intelligent process control of indium tin oxide sputter deposition using optical emission spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581572 ◽

1999 ◽

Vol 17 (1) ◽

pp. 190-197 ◽

Cited By ~ 15

Author(s):

I. L. Eisgruber ◽

J. R. Engel ◽

R. E. Hollingsworth ◽

P. K. Bhat ◽

R. Wendt

Keyword(s):

Process Control ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Sputter Deposition ◽

Intelligent Process ◽

Intelligent Process Control

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Estimation of Process Time Delay between Chamber Measurements and Optical Emission Spectroscopy : APC: Advanced Process Control

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185298 ◽

2020 ◽

Author(s):

Taikang Ning ◽

C.H. Huang ◽

J.A. Jensen ◽

V. Wong ◽

H. Chan

Keyword(s):

Time Delay ◽

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Process Time ◽

Advanced Process Control ◽

Chamber Measurements

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Process control by optical emission spectroscopy during growth of a-C: H from a CH4 plasma by plasma-enhanced chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(94)90241-0 ◽

1994 ◽

Vol 68-69 ◽

pp. 702-707 ◽

Cited By ~ 9

Author(s):

C. Barholm-Hansen ◽

M.D. Bentzon ◽

M.E. Vigild ◽

E. Findeisen ◽

R. Feidenhans'l ◽

...

Keyword(s):

Process Control ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Emission

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Arc Ion Plating Process Monitoring by Optical Emission Spectroscopy Exemplified for Chromium Containing Coatings

Plasma Processes and Polymers ◽

10.1002/ppap.200930806 ◽

2009 ◽

Vol 6 (S1) ◽

pp. S357-S361 ◽

Cited By ~ 2

Author(s):

Kirsten Bobzin ◽

Nazlim Bagcivan ◽

Philipp Immich ◽

Sebastian Theiß

Keyword(s):

Process Monitoring ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Arc Ion Plating ◽

Ion Plating

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Plasma process control with optical emission spectroscopy

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future' ◽

10.1109/iemt.1995.526109 ◽

2002 ◽

Cited By ~ 5

Author(s):

P.P. Ward

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Plasma Process

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Analysis of a reactive sputter ion plating discharge for TiN deposition using optical emission spectroscopy

Thin Solid Films ◽

10.1016/0040-6090(85)90030-6 ◽

1985 ◽

Vol 124 (1) ◽

pp. 67-73 ◽

Cited By ~ 14

Author(s):

A. Ricard ◽

H. Michel ◽

P. Jacquot ◽

M. Gantois

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating

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Determination of the electron temperature profile above the evaporative source in an ion plating discharge by spatially resolved optical emission spectroscopy

Thin Solid Films ◽

10.1016/s0040-6090(03)00140-8 ◽

2003 ◽

Vol 434 (1-2) ◽

pp. 157-161 ◽

Cited By ~ 1

Author(s):

A.D. Wilson ◽

A. Davison ◽

A. Leyland ◽

A. Matthews ◽

K.S. Fancey

Keyword(s):

Electron Temperature ◽

Temperature Profile ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating ◽

Spatially Resolved

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Optical emission spectroscopy as a process monitor for triod ion plating with TiN

10.1117/12.56653 ◽

1992 ◽

Cited By ~ 1

Author(s):

Mohamed Boumerzoug ◽

Peter Mascher ◽

Douglas R. Nagy

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating ◽

Process Monitor

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Determination of electron temperature in ion plating discharges by optical emission spectroscopy

Vacuum ◽

10.1016/0042-207x(91)90010-g ◽

1991 ◽

Vol 42 (15) ◽

pp. 1013-1015 ◽

Cited By ~ 10

Author(s):

K.S. Fancey ◽

A. Matthews

Keyword(s):

Electron Temperature ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating

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