Intelligent process control of indium tin oxide sputter deposition using optical emission spectroscopy

I. L. Eisgruber; J. R. Engel; R. E. Hollingsworth; P. K. Bhat; R. Wendt

doi:10.1116/1.581572

Intelligent process control of indium tin oxide sputter deposition using optical emission spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581572 ◽

1999 ◽

Vol 17 (1) ◽

pp. 190-197 ◽

Cited By ~ 15

Author(s):

I. L. Eisgruber ◽

J. R. Engel ◽

R. E. Hollingsworth ◽

P. K. Bhat ◽

R. Wendt

Keyword(s):

Process Control ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Sputter Deposition ◽

Intelligent Process ◽

Intelligent Process Control

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Reactive sputter deposition of indium tin oxide films onto polymeric webs using optical emission spectroscopy and mass spectroscopy as process monitoring and control

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00500-8 ◽

1997 ◽

Vol 94-95 ◽

pp. 583-586 ◽

Cited By ~ 1

Author(s):

Hitesh Patel ◽

Mohtashim Saif ◽

Hassan Memarian

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Sputter Deposition ◽

Monitoring And Control ◽

Reactive Sputter Deposition ◽

Process Monitoring And Control ◽

And Control ◽

Tin Oxide Films

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In situ monitoring of pulsed laser indium–tin-oxide film deposition by optical emission spectroscopy

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(01)00193-8 ◽

2001 ◽

Vol 56 (6) ◽

pp. 743-751 ◽

Cited By ~ 19

Author(s):

C. Calı̀ ◽

R. Macaluso ◽

M. Mosca

Keyword(s):

Oxide Film ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Pulsed Laser ◽

Optical Emission ◽

Film Deposition ◽

In Situ Monitoring

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Sputter deposition of Titanium and Nickel thin films in radio frequency magnetron discharge characterized by optical emission spectroscopy and by Rutherford backscattering spectrometry

Thin Solid Films ◽

10.1016/j.tsf.2017.03.032 ◽

2017 ◽

Vol 629 ◽

pp. 22-27 ◽

Cited By ~ 3

Author(s):

M. Salhi ◽

S.E.K. Abaidia ◽

S. Mammeri ◽

B. Bouaouina

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Rutherford Backscattering Spectrometry ◽

Optical Emission ◽

Sputter Deposition ◽

Rutherford Backscattering ◽

Magnetron Discharge ◽

Nickel Thin Films

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Estimation of Process Time Delay between Chamber Measurements and Optical Emission Spectroscopy : APC: Advanced Process Control

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185298 ◽

2020 ◽

Author(s):

Taikang Ning ◽

C.H. Huang ◽

J.A. Jensen ◽

V. Wong ◽

H. Chan

Keyword(s):

Time Delay ◽

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Process Time ◽

Advanced Process Control ◽

Chamber Measurements

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An investigation of tin oxide plasma-enhanced chemical vapor deposition using optical emission spectroscopy

Thin Solid Films ◽

10.1016/s0040-6090(02)00051-2 ◽

2002 ◽

Vol 406 (1-2) ◽

pp. 145-150 ◽

Cited By ~ 16

Author(s):

J.J. Robbins ◽

R.T. Alexander ◽

W. Xiao ◽

T.L. Vincent ◽

C.A. Wolden

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission

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Process control by optical emission spectroscopy during growth of a-C: H from a CH4 plasma by plasma-enhanced chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(94)90241-0 ◽

1994 ◽

Vol 68-69 ◽

pp. 702-707 ◽

Cited By ~ 9

Author(s):

C. Barholm-Hansen ◽

M.D. Bentzon ◽

M.E. Vigild ◽

E. Findeisen ◽

R. Feidenhans'l ◽

...

Keyword(s):

Process Control ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Emission

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Plasma process control with optical emission spectroscopy

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future' ◽

10.1109/iemt.1995.526109 ◽

2002 ◽

Cited By ~ 5

Author(s):

P.P. Ward

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Plasma Process

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Process control with optical emission spectroscopy in triode ion plating

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.572882 ◽

1985 ◽

Vol 3 (6) ◽

pp. 2364-2367 ◽

Cited By ~ 14

Author(s):

K. Salmenoja ◽

A. S. Korhonen ◽

M. S. Sulonen

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating

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The use of optical emission spectroscopy for process control in triode ion plating with ZrN

Vacuum ◽

10.1016/0042-207x(86)90265-4 ◽

1986 ◽

Vol 36 (1-3) ◽

pp. 33-35 ◽

Cited By ~ 15

Author(s):

K Salmenoja ◽

AS Korhonen

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Ion Plating

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Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

Plasma Sources Science and Technology ◽

10.1088/0963-0252/24/6/065022 ◽

2015 ◽

Vol 24 (6) ◽

pp. 065022 ◽

Cited By ~ 14

Author(s):

P Vašina ◽

M Fekete ◽

J Hnilica ◽

P Klein ◽

L Dosoudilová ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Titanium Atom ◽

Optical Emission ◽

Sputter Deposition

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