High-breakdown-voltage AlGaN-channel metal-insulator-semiconductor heterostructure field-effect transistors employing a quaternary AlGaInN barrier layer and an Al2O3 gate insulator
2019 ◽
Vol 37
(4)
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pp. 041205
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2011 ◽
Vol 29
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pp. 01A809
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2003 ◽
Vol 24
(9)
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pp. 541-543
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2003 ◽
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pp. 350-354
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2007 ◽
Vol 46
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pp. 2309-2311
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2011 ◽
Vol 50
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pp. 084102
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