High-breakdown-voltage AlGaN-channel metal-insulator-semiconductor heterostructure field-effect transistors employing a quaternary AlGaInN barrier layer and an Al2O3 gate insulator

Author(s):  
Daiki Hosomi ◽  
Keita Furuoka ◽  
Heng Chen ◽  
Saki Saito ◽  
Toshiharu Kubo ◽  
...  
2011 ◽  
Vol 50 (8R) ◽  
pp. 084102 ◽  
Author(s):  
Yoshinori Oshimura ◽  
Takayuki Sugiyama ◽  
Kenichiro Takeda ◽  
Motoaki Iwaya ◽  
Tetsuya Takeuchi ◽  
...  

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