Evaluating Al2O3 gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques

2013 ◽  
Vol 31 (1) ◽  
pp. 01A122 ◽  
Author(s):  
Jacob A. Bertrand ◽  
Steven M. George
2006 ◽  
Vol 89 (3) ◽  
pp. 031915 ◽  
Author(s):  
P. F. Carcia ◽  
R. S. McLean ◽  
M. H. Reilly ◽  
M. D. Groner ◽  
S. M. George

2006 ◽  
Vol 88 (5) ◽  
pp. 051907 ◽  
Author(s):  
M. D. Groner ◽  
S. M. George ◽  
R. S. McLean ◽  
P. F. Carcia

RSC Advances ◽  
2017 ◽  
Vol 7 (10) ◽  
pp. 5601-5609 ◽  
Author(s):  
Kwan Hyuck Yoon ◽  
Hongbum Kim ◽  
Yong-Eun Koo Lee ◽  
Nabeen K. Shrestha ◽  
Myung Mo Sung

We present UV-ALD as a promising approach to fabricate effective gas-diffusion barrier thin films at low deposition temperature (40 °C).


2021 ◽  
Vol MA2021-02 (29) ◽  
pp. 873-873
Author(s):  
Jaynlynn Sosa ◽  
Matthieu Chazot ◽  
Corbin Feit ◽  
Alexandros Kostogiannes ◽  
Myungkoo Kang ◽  
...  

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