atomic layer deposition technique
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scholarly journals SiO2 thin film growth through a pure atomic layer deposition technique at room temperature

RSC Advances ◽  
2020 ◽  
Vol 10 (31) ◽  
pp. 18073-18081
Author(s):  
D. Arl ◽  
V. Rogé ◽  
N. Adjeroud ◽  
B. R. Pistillo ◽  
M. Sarr ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Deposition Technique ◽  
Sio2 Thin Film ◽  
Layer Deposition ◽  
Atomic Layer Deposition Technique

In this study, less contaminated and porous SiO2 films were grown via ALD at room temperature.

Highly stable Zn metal anodes enabled by atomic layer deposited Al2O3 coating for aqueous zinc-ion batteries

2020 ◽  
Vol 8 (16) ◽  
pp. 7836-7846 ◽  
Author(s):  
Huibing He ◽  
Huan Tong ◽  
Xueyang Song ◽  
Xiping Song ◽  
Jian Liu
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zinc Ion ◽  
Al2o3 Coating ◽  
Deposition Technique ◽  
Layer Deposition ◽  
Atomic Layer Deposition Technique ◽  
Metal Anodes

Nanoscale Al2O3 coating by an atomic layer deposition technique enabled safe and dendrite-free Zn anodes for rechargeable aqueous zinc-ion batteries.

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