The origin of low water vapor transmission rates through Al2O3/ZrO2 nanolaminate gas-diffusion barriers grown by atomic layer deposition

2010 ◽  
Vol 96 (24) ◽  
pp. 243308 ◽  
Author(s):  
J. Meyer ◽  
H. Schmidt ◽  
W. Kowalsky ◽  
T. Riedl ◽  
A. Kahn
Keyword(s):  
Water Vapor ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gas Diffusion ◽  
Diffusion Barriers ◽  
Transmission Rates ◽  
Layer Deposition ◽  
Water Vapor Transmission

Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers

2006 ◽  
Vol 89 (3) ◽  
pp. 031915 ◽  
Author(s):  
P. F. Carcia ◽  
R. S. McLean ◽  
M. H. Reilly ◽  
M. D. Groner ◽  
S. M. George
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gas Diffusion ◽  
Diffusion Barriers ◽  
Layer Deposition

scholarly journals Characterization of oxide barrier layers prepared by atomic layer deposition

2017 ◽  
Vol 9 (7) ◽  
pp. 168781401771180 ◽  
Author(s):  
Fa-Ta Tsai ◽  
Ching-Kong Chao ◽  
Kai-Jyun Jhong ◽  
Rwei-Ching Chang
Keyword(s):  
Water Vapor ◽  
Atomic Layer Deposition ◽  
Layer Structure ◽  
Transmission Rate ◽  
Single Layer ◽  
Atomic Layer ◽  
Optical Transmittance ◽  
Double Layer Structure ◽  
Layer Deposition ◽  
Water Vapor Transmission

Atomic layer deposition has become an important thin-film growth technique for producing gas diffusion barriers because of its low process temperature and its ability to produce uniform films. In this work, atomic layer deposition was used to deposit various Al2O3 and ZnO thin films on polyethylene terephthalate substrates; subsequently, the physical properties and water vapor transmission rates of the films were characterized. Single and hybrid films (Al2O3, ZnO, Al2O3/ZnO, and ZnO/Al2O3) with thicknesses of 25, 50, and 100 nm at a deposition temperature of 60°C were investigated. The deposited films were characterized for surface roughness, optical transmittance, adhesion, water vapor transmission rate, and contact angle. The results showed that the double-layer structure provided a higher water vapor transmission rate and higher adhesion strength than those of the single-layer structure although both the surface roughness and optical transmittance of the single-layer structure were slightly better than those of the double-layer structure. The results revealed that the atomic layer deposition-grown hybrids could act as water vapor barriers.

Gas diffusion barriers on polymers using Al2O3 atomic layer deposition

2006 ◽  
Vol 88 (5) ◽  
pp. 051907 ◽  
Author(s):  
M. D. Groner ◽  
S. M. George ◽  
R. S. McLean ◽  
P. F. Carcia
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gas Diffusion ◽  
Diffusion Barriers ◽  
Layer Deposition

scholarly journals UV-enhanced atomic layer deposition of Al2O3 thin films at low temperature for gas-diffusion barriers

RSC Advances ◽  
2017 ◽  
Vol 7 (10) ◽  
pp. 5601-5609 ◽  
Author(s):  
Kwan Hyuck Yoon ◽  
Hongbum Kim ◽  
Yong-Eun Koo Lee ◽  
Nabeen K. Shrestha ◽  
Myung Mo Sung
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Diffusion Barrier ◽  
Deposition Temperature ◽  
Atomic Layer ◽  
Gas Diffusion ◽  
Diffusion Barriers ◽  
Layer Deposition ◽  
Low Deposition Temperature

We present UV-ALD as a promising approach to fabricate effective gas-diffusion barrier thin films at low deposition temperature (40 °C).

Improved electrical properties of Pt/HfO2/Ge using in situ water vapor treatment and atomic layer deposition

2011 ◽  
Vol 98 (10) ◽  
pp. 102905 ◽  
Author(s):  
In-Sung Park ◽  
Youngjae Choi ◽  
William T. Nichols ◽  
Jinho Ahn
Keyword(s):  
Water Vapor ◽  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Vapor Treatment
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