Fast aerial image simulations using one basis mask pattern for optical proximity correction

2011 ◽  
Vol 29 (6) ◽  
pp. 06FH03 ◽  
Author(s):  
Shiyuan Liu ◽  
Xiaofei Wu ◽  
Wei Liu ◽  
Chuanwei Zhang
Keyword(s):  
Aerial Image ◽  
Mask Pattern ◽  
Optical Proximity Correction ◽  
Image Simulations

Accuracy of diffused aerial image model for full-chip-level optical proximity correction

2000 ◽  
Author(s):  
Jee-Suk Hong ◽  
Hee-Bom Kim ◽  
Hyoung-Soon Yune ◽  
Chang-Nam Ahn ◽  
Young-Mo Koo ◽  
...  
Keyword(s):  
Aerial Image ◽  
Image Model ◽  
Optical Proximity Correction

Fast and accurate optical proximity correction based on aerial image simulation

1996 ◽  
Author(s):  
Tetsuro Hanawa ◽  
Kazuya Kamon ◽  
Akihiro Nakae ◽  
Shuji Nakao ◽  
Koichi Moriizumi
Keyword(s):  
Aerial Image ◽  
Image Simulation ◽  
Optical Proximity Correction

Quantifying EUV imaging tolerances for the 70-, 50-, 35-nm modes through rigorous aerial image simulations

2001 ◽  
Author(s):  
Christof G. Krautschik ◽  
Masaaki Ito ◽  
Iwao Nishiyama ◽  
Takashi Mori
Keyword(s):  
Aerial Image ◽  
Image Simulations ◽  
Euv Imaging

Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

2002 ◽  
Author(s):  
Frank A. Driessen ◽  
Paul van Adrichem ◽  
Vicky Philipsen ◽  
Rik M. Jonckheere ◽  
Hua-Yu Liu ◽  
...  
Keyword(s):  
Aerial Image ◽  
193 Nm ◽  
Image Simulations

Optical proximity correction: Mask pattern-generation challenges

1996 ◽  
Vol 30 (1-4) ◽  
pp. 115-118 ◽  
Author(s):  
R. Jonckheere ◽  
A. Wong ◽  
A. Yen ◽  
K. Ronse ◽  
L. Van den hove
Keyword(s):  
Pattern Generation ◽  
Mask Pattern ◽  
Optical Proximity Correction

Computers and diffraction analysis

1989 ◽  
Vol 47 ◽  
pp. 44-45
Author(s):  
J. A. Eades
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Electron Diffraction ◽  
Diffraction Analysis ◽  
Electron Diffraction Analysis ◽  
Image Simulation ◽  
Correct Interpretation ◽  
High Profile ◽  
High Resolution Images ◽  
Image Simulations

For well over two decades computers have played an important role in electron microscopy; they now pervade the whole field - as indeed they do in so many other aspects of our lives. The initial use of computers was mainly for large (as it seemed then) off-line calculations for image simulations; for example, of dislocation images.Image simulation has continued to be one of the most notable uses of computers particularly since it is essential to the correct interpretation of high resolution images. In microanalysis, too, the computer has had a rather high profile. In this case because it has been a necessary part of the equipment delivered by manufacturers. By contrast the use of computers for electron diffraction analysis has been slow to prominence. This is not to say that there has been no activity, quite the contrary; however it has not had such a great impact on the field.

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