Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

2002 ◽  
Author(s):  
Frank A. Driessen ◽  
Paul van Adrichem ◽  
Vicky Philipsen ◽  
Rik M. Jonckheere ◽  
Hua-Yu Liu ◽  
...  
Keyword(s):  
Aerial Image ◽  
193 Nm ◽  
Image Simulations

Aerial image measurement technique for fast evaluation of 193-nm lithography masks

2004 ◽  
Author(s):  
Axel M. Zibold ◽  
Thomas Scheruebl ◽  
Wolfgang Harnisch ◽  
Robert Brunner ◽  
J. Greif
Keyword(s):  
Measurement Technique ◽  
Aerial Image ◽  
Image Measurement ◽  
Fast Evaluation ◽  
193 Nm

Aerial image measurement technique for today's and future 193-nm lithography mask requirements

2004 ◽  
Author(s):  
Axel M. Zibold ◽  
Thomas Scheruebl ◽  
Alexander Menck ◽  
Robert Brunner ◽  
J. Greif
Keyword(s):  
Measurement Technique ◽  
Aerial Image ◽  
Image Measurement ◽  
193 Nm

Aerial image measuring system at 193 nm: a tool-to-tool comparison and global CD mapping

2004 ◽  
Author(s):  
Axel M. Zibold ◽  
Rainer Schmid ◽  
Klaus Boehm ◽  
Robert Birkner
Keyword(s):  
Measuring System ◽  
Aerial Image ◽  
193 Nm

Aerial-image based inspection of AAPSM for 193-nm lithography generation

2003 ◽  
Author(s):  
Anja Rosenbusch ◽  
Shirley Hemar ◽  
Reuven Falah
Keyword(s):  
Aerial Image ◽  
193 Nm

Quantifying EUV imaging tolerances for the 70-, 50-, 35-nm modes through rigorous aerial image simulations

2001 ◽  
Author(s):  
Christof G. Krautschik ◽  
Masaaki Ito ◽  
Iwao Nishiyama ◽  
Takashi Mori
Keyword(s):  
Aerial Image ◽  
Image Simulations ◽  
Euv Imaging

Using the aerial image measurement technique to speed up mask development for 193-nm immersion and polarization lithography

2005 ◽  
Author(s):  
Axel M. Zibold ◽  
Wolfgang Harnisch ◽  
Thomas Scheruebl ◽  
Norbert Rosenkranz ◽  
Joern Greif
Keyword(s):  
Measurement Technique ◽  
Aerial Image ◽  
Image Measurement ◽  
Speed Up ◽  
193 Nm

Computers and diffraction analysis

1989 ◽  
Vol 47 ◽  
pp. 44-45
Author(s):  
J. A. Eades
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Electron Diffraction ◽  
Diffraction Analysis ◽  
Electron Diffraction Analysis ◽  
Image Simulation ◽  
Correct Interpretation ◽  
High Profile ◽  
High Resolution Images ◽  
Image Simulations

For well over two decades computers have played an important role in electron microscopy; they now pervade the whole field - as indeed they do in so many other aspects of our lives. The initial use of computers was mainly for large (as it seemed then) off-line calculations for image simulations; for example, of dislocation images.Image simulation has continued to be one of the most notable uses of computers particularly since it is essential to the correct interpretation of high resolution images. In microanalysis, too, the computer has had a rather high profile. In this case because it has been a necessary part of the equipment delivered by manufacturers. By contrast the use of computers for electron diffraction analysis has been slow to prominence. This is not to say that there has been no activity, quite the contrary; however it has not had such a great impact on the field.

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