Electrical resistivity change in Al:ZnO thin films dynamically deposited by bipolar pulsed direct-current sputtering and a remote plasma source

2010 ◽  
Vol 28 (4) ◽  
pp. 856-860 ◽  
Author(s):  
Wonkyun Yang ◽  
Junghoon Joo
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Direct Current ◽  
Plasma Source ◽  
Resistivity Change ◽  
Remote Plasma ◽  
Pulsed Direct Current ◽  
Direct Current Sputtering

Interplay between variable direct current sputtering deposition process parameters and properties of ZnO:Ga thin films

2018 ◽  
Vol 660 ◽  
pp. 538-545 ◽  
Author(s):  
Mohammad Tanvirul Ferdaous ◽  
Seyed Ahmad Shahahmadi ◽  
Megat Mohd Izhar Sapeli ◽  
Puvaneswaran Chelvanathan ◽  
Md. Akhtaruzzaman ◽  
...  
Keyword(s):  
Thin Films ◽  
Process Parameters ◽  
Direct Current ◽  
Deposition Process ◽  
Sputtering Deposition ◽  
Direct Current Sputtering

Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in a reactive gas admixture

2013 ◽  
Vol 103 (3) ◽  
pp. 033118 ◽  
Author(s):  
Oleksandr Polonskyi ◽  
Tilo Peter ◽  
Amir Mohammad Ahadi ◽  
Alexander Hinz ◽  
Thomas Strunskus ◽  
...  
Keyword(s):  
Gas Phase ◽  
Direct Current ◽  
Pulsed Direct Current ◽  
Direct Current Sputtering ◽  
Nanoparticle Generation ◽  
Reactive Gas

Deposition and characterization of pulsed direct current magnetron sputtered Al95.5Cr2.5Si2 (N1−xOx) thin films

2010 ◽  
Vol 519 (1) ◽  
pp. 319-324 ◽  
Author(s):  
H. Najafi ◽  
A. Shetty ◽  
A. Karimi ◽  
M. Morstein
Keyword(s):  
Thin Films ◽  
Direct Current ◽  
Pulsed Direct Current
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