Robust, efficient grating couplers for planar optical waveguides using no-photoacid generator SU-8 electron beam lithography

2009 ◽  
Vol 27 (6) ◽  
pp. 2602
Author(s):  
A. L. Bross ◽  
G. Lafyatis ◽  
R. Ayachitula ◽  
A. Morss ◽  
R. Hardman ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Optical Waveguides ◽  
Grating Couplers ◽  
Photoacid Generator ◽  
Planar Optical Waveguides

Grating Coupled Waveguide Biosensor Based on Porous Silicon

2011 ◽  
Vol 1301 ◽  
Author(s):  
Xing Wei ◽  
Sharon M. Weiss
Keyword(s):  
Electron Beam ◽  
Porous Silicon ◽  
Nucleic Acids ◽  
Surface Area ◽  
Small Molecule ◽  
Electron Beam Lithography ◽  
Low Cost ◽  
Grating Couplers ◽  
Silicon Waveguides ◽  
A New Technique

ABSTRACTPorous silicon waveguides with integrated porous silicon grating couplers are demonstrated as small molecule biosensors. Two fabrication methods are presented for the grating couplers: standard electron beam lithography with reactive ion etching and a new technique based on direct imprinting of porous substrates. Although the gratings fabricated using standard lithographic techniques have steeper sidewalls and enable a larger available sensing surface area inside the waveguide, the imprinted gratings have the advantage of rapid and low-cost fabrication. Both the lithographically and imprinted sensors are shown to have waveguide losses on the order of 10 dB/cm, and both are demonstrated for detection of 16mer nucleic acids.

Sub-Micron Integrated Grating Couplers for Single-Mode Planar Optical Waveguides

2008 ◽  
Author(s):  
Colin M. Hayes ◽  
Marcelo B. Pereira ◽  
Baylor C. Brangers ◽  
Mustafa M. Aslan ◽  
Rodrigo Sergio Wiederkehr ◽  
...  
Keyword(s):  
Optical Waveguides ◽  
Single Mode ◽  
Grating Couplers ◽  
Planar Optical Waveguides

Electron beam lithography on LiF films for integrated active optical waveguides

1998 ◽  
Author(s):  
Giuseppe Baldacchini ◽  
E. Burattini ◽  
Antonio Grilli ◽  
A. Raco ◽  
Antonella Mancini ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Optical Waveguides

Soluble Conducting Polythiophenes for Charge Dissipation in Electron Beam Lithography

1993 ◽  
Vol 328 ◽  
Author(s):  
Wu-Song Huang
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Water Soluble ◽  
Acid Form ◽  
Salt Form ◽  
Chemical Polymerization ◽  
Polymeric Layer ◽  
Aqueous Base ◽  
Soluble Acid ◽  
Photoacid Generator

ABSTRACTIn electron beam lithography, charging on photoresist usually causes image distortion and placement error. To dissipate the charge, a conductive polymeric layer can be introduced either over or under the photoresist coating. In this paper, we will discuss the approach of using toluene and xylene soluble polyalkylthiophcne in combination with photoacid generator as a discharge underlayer or interlayer beneath photoresist to dissipate the accumulated charge during li-bcam exposure. We will also discuss the use of water soluble acid or ammonium salt form of poly 3- (cthanesulfonate) thiophene as discharge. toplayer. During the resist image developing process, the toplayer will be removed by aqueous base. Therefore, it is advantageous to use discharge toplayer due to its simplicity. In this study, the salt and acid form of poly 3- (ethanesulfonate) thiophene was synthesized through chemical polymerization of the corresponding methanesulfonate ester. It exhibits the same properties as that of electrochemically synthesized polymer reported in the literature.

Output grating couplers on planar optical waveguides as direct immunosensors

1991 ◽  
Vol 6 (3) ◽  
pp. 227-232 ◽  
Author(s):  
W. Lukosz ◽  
D. Clerc ◽  
Ph.M. Nellen ◽  
Ch. Stamm ◽  
P. Weiss
Keyword(s):  
Optical Waveguides ◽  
Grating Couplers ◽  
Planar Optical Waveguides

Polyimide optical waveguides fabricated with electron beam lithography

1990 ◽  
Vol 29 (27) ◽  
pp. 3880 ◽  
Author(s):  
M. J. Rooks ◽  
H. V. Roussell ◽  
L. M. Johnson
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Optical Waveguides

A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

2017 ◽  
Vol 1 (9) ◽  
pp. 1895-1899 ◽  
Author(s):  
Santu Nandi ◽  
Midathala Yogesh ◽  
Pulikanti Guruprasad Reddy ◽  
Satinder K. Sharma ◽  
Chullikkattil P. Pradeep ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Pattern Transfer ◽  
Photoacid Generator ◽  
Transfer Potential

A new PAG integrated electron beam active terpolymer resist has been developed for high resolution pattern transfer applications.

Synthesis of Novel Photoacid Generator Containing Resist Polymer for Electron Beam Lithography

2012 ◽  
Vol 12 (1) ◽  
pp. 725-729 ◽  
Author(s):  
Koh Eun Lee ◽  
Min Jeong Kim ◽  
Jae Beom Yoo ◽  
Hemant S. Mondkar ◽  
Kyunghwa Sohn ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Photoacid Generator
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