InAlN∕GaN metal-oxide-semiconductor high electron mobility transistor with Al[sub 2]O[sub 3] insulating films grown by metal organic chemical vapor deposition using Ar and NH[sub 3] carrier gases

Author(s):  
K. Čičo ◽  
J. Kuzmík ◽  
J. Liday ◽  
K. Hušeková ◽  
G. Pozzovivo ◽  
...  
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