Process variation-aware three-dimensional proximity effect correction for electron beam direct writing at 45nm node and beyond

2008 ◽  
Vol 26 (6) ◽  
pp. 2032-2038 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Process Variation ◽  
Three Dimensional ◽  
Direct Writing ◽  
Proximity Effect Correction

Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3762-3766 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Multilayer Structures ◽  
Proximity Effect Correction

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction
Sign in / Sign up

Export Citation Format

Share Document