Proximity effect correction by a supplementary-exposure method in high-throughput block-exposure electron-beam direct writing

1998 ◽  
Author(s):  
Takeo Nagata ◽  
Yasuo Manabe ◽  
Yasuo Nara ◽  
Nobuo Sasaki ◽  
Yasuhide Machida
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Proximity Effect ◽  
Direct Writing ◽  
Exposure Method ◽  
Proximity Effect Correction

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction
Sign in / Sign up

Export Citation Format

Share Document