Proximity effect correction for an electron beam direct writing system EX-7

Takayuki Abe

doi:10.1116/1.584525

Proximity effect correction for an electron beam direct writing system EX-7

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584525 ◽

1989 ◽

Vol 7 (6) ◽

pp. 1524 ◽

Cited By ~ 3

Author(s):

Takayuki Abe

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Writing System ◽

Direct Writing ◽

Proximity Effect Correction

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Improved Proximity Effect Correction Technique Suitable for Cell Projection Electron Beam Direct Writing System

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.6953 ◽

1994 ◽

Vol 33 (Part 1, No. 12B) ◽

pp. 6953-6958 ◽

Cited By ~ 3

Author(s):

Takao Tamura ◽

Ken Nakajima ◽

Hiroshi Nozue

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Writing System ◽

Direct Writing ◽

Correction Technique ◽

Proximity Effect Correction

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One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing

10.1117/12.275792 ◽

1997 ◽

Cited By ~ 1

Author(s):

Yasuhisa Yamada ◽

Takao Tamura ◽

Ken Nakajima ◽

Hiroshi Nozue

Keyword(s):

Electron Beam ◽

Calculation Method ◽

Proximity Effect ◽

Direct Writing ◽

One Dimensional ◽

Proximity Effect Correction

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Proximity effect correction by a supplementary-exposure method in high-throughput block-exposure electron-beam direct writing

10.1117/12.309587 ◽

1998 ◽

Cited By ~ 2

Author(s):

Takeo Nagata ◽

Yasuo Manabe ◽

Yasuo Nara ◽

Nobuo Sasaki ◽

Yasuhide Machida

Keyword(s):

Electron Beam ◽

High Throughput ◽

Proximity Effect ◽

Direct Writing ◽

Exposure Method ◽

Proximity Effect Correction

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Proximity effect correction using multilevel area density maps for character projection based electron beam direct writing toward 14 nm node and beyond

10.1117/12.916353 ◽

2012 ◽

Cited By ~ 1

Author(s):

Kozo Ogino ◽

Hiromi Hoshino ◽

Takashi Maruyama ◽

Yasuhide Machida ◽

Shinji Sugatani

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Direct Writing ◽

Area Density ◽

Density Maps ◽

Proximity Effect Correction

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Process variation-aware three-dimensional proximity effect correction for electron beam direct writing at 45nm node and beyond

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3013861 ◽

2008 ◽

Vol 26 (6) ◽

pp. 2032-2038 ◽

Cited By ~ 9

Author(s):

Kozo Ogino ◽

Hiromi Hoshino ◽

Yasuhide Machida

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Process Variation ◽

Three Dimensional ◽

Direct Writing ◽

Proximity Effect Correction

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Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/abc78d ◽

2020 ◽

Vol 59 (12) ◽

pp. 126502

Author(s):

Moataz Eissa ◽

Takuya Mitarai ◽

Tomohiro Amemiya ◽

Yasuyuki Miyamoto ◽

Nobuhiko Nishiyama

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Electron Beam Lithography ◽

Photonic Waveguides ◽

Proximity Effect Correction

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True three-dimensional proximity effect correction in electron-beam lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2388960 ◽

2006 ◽

Vol 24 (6) ◽

pp. 3115 ◽

Cited By ~ 14

Author(s):

Kasi Anbumony ◽

S.-Y. Lee

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Proximity Effect Correction

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Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.5001686 ◽

2017 ◽

Vol 35 (5) ◽

pp. 051603 ◽

Cited By ~ 4

Author(s):

Chun Nien ◽

Li-Cheng Chang ◽

Jia-Hao Ye ◽

Vin-Cent Su ◽

Chao-Hsin Wu ◽

...

Keyword(s):

Electron Beam ◽

Swarm Intelligence ◽

Proximity Effect ◽

Electron Beam Lithography ◽

Development Time ◽

Proximity Effect Correction

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Shape and dose control for proximity effect correction on massively parallel electron-beam systems

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/6.0000556 ◽

2020 ◽

Vol 38 (6) ◽

pp. 062603

Author(s):

Md Nabid Hasan ◽

Soo-Young Lee ◽

Byung-Sup Ahn ◽

Jin Choi ◽

Joon-Soo Park

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Massively Parallel ◽

Dose Control ◽

Proximity Effect Correction

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Electron-beam lithography simulation for mask making: VI. Comparison of 10- and 50-kV GHOST proximity effect correction

10.1117/12.438354 ◽

2001 ◽

Cited By ~ 1

Author(s):

Chris A. Mack

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Electron Beam Lithography ◽

Lithography Simulation ◽

Mask Making ◽

Proximity Effect Correction

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