Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography

2005 ◽  
Vol 23 (1) ◽  
pp. 138 ◽  
Author(s):  
Ivan Junarsa ◽  
Mark P. Stoykovich ◽  
Paul F. Nealey ◽  
Yuansheng Ma ◽  
Franco Cerrina ◽  
...  
Keyword(s):  
High Resolution ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Hydrogen Silsesquioxane ◽  
Ultraviolet Lithography ◽  
Negative Tone

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

2016 ◽  
Vol 9 (1) ◽  
pp. 17-21 ◽  
Author(s):  
Pulikanti Guruprasad Reddy ◽  
Satyendra Prakash Pal ◽  
Pawan Kumar ◽  
Chullikkattil P. Pradeep ◽  
Subrata Ghosh ◽  
...  
Keyword(s):  
High Resolution ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Negative Tone

scholarly journals Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

2013 ◽  
Vol 12 (3) ◽  
pp. 033010 ◽  
Author(s):  
Andreas Frommhold ◽  
Dongxu Yang ◽  
Alexandra McClelland ◽  
Xiang Xue ◽  
Yasin Ekinci ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Negative Tone

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity
Sign in / Sign up

Export Citation Format

Share Document