scholarly journals Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

2015 ◽  
Author(s):  
Andreas Frommhold ◽  
Alexandra McClelland ◽  
Dongxu Yang ◽  
Richard E. Palmer ◽  
John Roth ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Negative Tone

scholarly journals Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

2013 ◽  
Vol 12 (3) ◽  
pp. 033010 ◽  
Author(s):  
Andreas Frommhold ◽  
Dongxu Yang ◽  
Alexandra McClelland ◽  
Xiang Xue ◽  
Yasin Ekinci ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Negative Tone

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

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