scholarly journals Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme ultraviolet lithography

2017 ◽  
Vol 35 (2) ◽  
pp. 021603 ◽  
Author(s):  
Vishal Desai ◽  
Mac Mellish ◽  
Stephen Bennett ◽  
Nathaniel C. Cady
Keyword(s):  
High Resolution ◽  
Process Development ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Hydrogen Silsesquioxane ◽  
Ultraviolet Lithography

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

2016 ◽  
Vol 9 (1) ◽  
pp. 17-21 ◽  
Author(s):  
Pulikanti Guruprasad Reddy ◽  
Satyendra Prakash Pal ◽  
Pawan Kumar ◽  
Chullikkattil P. Pradeep ◽  
Subrata Ghosh ◽  
...  
Keyword(s):  
High Resolution ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Negative Tone

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

2010 ◽  
Vol 87 (11) ◽  
pp. 2134-2138 ◽  
Author(s):  
Chang Young Jeong ◽  
Sangsul Lee ◽  
Hyun-Duck Shin ◽  
Tae Geun Kim ◽  
Jinho Ahn
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Shadowing Effect

Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

2005 ◽  
Vol 44 (7B) ◽  
pp. 5560-5564 ◽  
Author(s):  
Sang-Ho Lee ◽  
Young-Jae Kang ◽  
Jin-Goo Park ◽  
Ahmed A. Busnaina ◽  
Jong-Myung Lee ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Laser Shock ◽  
Ultraviolet Lithography ◽  
Capping Layer
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