High-resolution actinic defect inspection for extreme ultraviolet lithography multilayer mask blanks by photoemission electron microscopy

2006 ◽  
Vol 88 (5) ◽  
pp. 053113 ◽  
Author(s):  
U. Neuhäusler ◽  
A. Oelsner ◽  
J. Slieh ◽  
M. Brzeska ◽  
A. Wonisch ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Defect Inspection ◽  
Photoemission Electron Microscopy ◽  
Ultraviolet Lithography ◽  
Photoemission Electron

scholarly journals Photoemission electron microscopy using extreme ultraviolet attosecond pulse trains

2009 ◽  
Vol 80 (12) ◽  
pp. 123703 ◽  
Author(s):  
A. Mikkelsen ◽  
J. Schwenke ◽  
T. Fordell ◽  
G. Luo ◽  
K. Klünder ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Extreme Ultraviolet ◽  
Attosecond Pulse ◽  
Photoemission Electron Microscopy ◽  
Pulse Trains ◽  
Photoemission Electron

A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy

2006 ◽  
Vol 83 (4-9) ◽  
pp. 680-683 ◽  
Author(s):  
U. Neuhäusler ◽  
J. Lin ◽  
A. Oelsner ◽  
M. Schicketanz ◽  
D. Valdaitsev ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Standing Wave ◽  
Defect Inspection ◽  
New Approach ◽  
Photoemission Electron Microscopy ◽  
Photoemission Electron
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