Characteristics of Pt/Bi3.25La0.75Ti3O12/ZrO2/Si structures using ZrO2 as buffer layers for ferroelectric-gate field-effect transistors

2004 ◽  
Vol 22 (4) ◽  
pp. 1739-1742 ◽  
Author(s):  
Jung-Mi Lee ◽  
Kyoung-Tae Kim ◽  
Chang-Il Kim
1995 ◽  
Vol 379 ◽  
Author(s):  
Jeffrey J. Welser

ABSTRACTThe experimental application of strained-Si / relaxed-Si1−xGex heterostructures to n-MOSFETs is discussed, focusing on the enhanced mobility provided by the strain. This paper provides an overview of the theoretically-predicted electronic properties of these heterostructures, as well as their growth. Several practical issues which arise in MOS applications are covered, including the effect of the relaxed-Si1−xGex, buffer layers on diode performance, and the observation of self-heating effects in the output characteristics of the MOS transistors.


1988 ◽  
Vol 53 (25) ◽  
pp. 2513-2515 ◽  
Author(s):  
K. Steiner ◽  
U. Seiler ◽  
K. Heime ◽  
E. Kuphal

2016 ◽  
Vol 4 (43) ◽  
pp. 10386-10394 ◽  
Author(s):  
Md. Shafiqur Rahman ◽  
Susmita Ghose ◽  
Liang Hong ◽  
Pradip Dhungana ◽  
Abbas Fahami ◽  
...  

SrTiO3 films on GaAs, grown by molecular beam epitaxy, serve as buffer layers for epitaxial growth of ferromagnetic or multiferroic films using pulsed laser deposition.


1999 ◽  
Vol 38 (Part 1, No. 2B) ◽  
pp. 1186-1189 ◽  
Author(s):  
Arlene Wakita ◽  
Hans Rohdin ◽  
Virginia Robbins ◽  
Nick Moll ◽  
Chung-Yi Su ◽  
...  

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