Influence ofp‐InP buffer layers on submicron InGaAs/InP junction field‐effect transistors

1988 ◽  
Vol 53 (25) ◽  
pp. 2513-2515 ◽  
Author(s):  
K. Steiner ◽  
U. Seiler ◽  
K. Heime ◽  
E. Kuphal
2020 ◽  
Vol 67 (10) ◽  
pp. 3972-3977 ◽  
Author(s):  
Chen Yang ◽  
Houqiang Fu ◽  
Viswanathan Naveen Kumar ◽  
Kai Fu ◽  
Hanxiao Liu ◽  
...  

2006 ◽  
Vol 53 (5) ◽  
pp. 3004-3012 ◽  
Author(s):  
G.-F. Dalla Betta ◽  
M. Boscardin ◽  
F. Fenotti ◽  
L. Pancheri ◽  
C. Piemonte ◽  
...  

1995 ◽  
Vol 379 ◽  
Author(s):  
Jeffrey J. Welser

ABSTRACTThe experimental application of strained-Si / relaxed-Si1−xGex heterostructures to n-MOSFETs is discussed, focusing on the enhanced mobility provided by the strain. This paper provides an overview of the theoretically-predicted electronic properties of these heterostructures, as well as their growth. Several practical issues which arise in MOS applications are covered, including the effect of the relaxed-Si1−xGex, buffer layers on diode performance, and the observation of self-heating effects in the output characteristics of the MOS transistors.


1994 ◽  
Vol 23 (8) ◽  
pp. 809-818 ◽  
Author(s):  
M. E. Sherwin ◽  
J. C. Zolper ◽  
A. G. Baca ◽  
T. J. Drummond ◽  
R. J. Shul ◽  
...  

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