Structural and electrical characteristics of chemical vapor deposited W/n-Si0.83Ge0.17/Si(001) and chemical vapor deposited WSix/n-Si0.83Ge0.17/Si(001)

2001 ◽  
Vol 19 (4) ◽  
pp. 1046-1051
Author(s):  
Y. C. Jang ◽  
D. O. Shin ◽  
K. S. Kim ◽  
K.-H. Shim ◽  
N.-E. Lee ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited

Electrical characteristics of Schottky diodes fabricated using plasma assisted chemical vapor deposited diamond films

1988 ◽  
Vol 53 (7) ◽  
pp. 586-588 ◽  
Author(s):  
G. Sh. Gildenblat ◽  
S. A. Grot ◽  
C. R. Wronski ◽  
A. R. Badzian ◽  
T. Badzian ◽  
...  
Keyword(s):  
Schottky Diodes ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited

Plasma etched polycrystalline hot‐filament chemical vapor deposited diamond thin films and their electrical characteristics

1994 ◽  
Vol 65 (22) ◽  
pp. 2827-2829 ◽  
Author(s):  
B. Y. Liaw ◽  
T. Stacy ◽  
G. Zhao ◽  
E. J. Charlson ◽  
E. M. Charlson ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited ◽  
Diamond Thin Films ◽  
Hot Filament

Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films

2003 ◽  
Vol 433-436 ◽  
pp. 451-454 ◽  
Author(s):  
Hoa Thi Mai Pham ◽  
Tolgay Akkaya ◽  
Charles R. de Boer ◽  
Pasqualina M. Sarro
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited

Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

2001 ◽  
Vol 148 (6) ◽  
pp. F115 ◽  
Author(s):  
Zhen-Cheng Wu ◽  
Zhi-Wen Shiung ◽  
Chiu-Chih Chiang ◽  
Wei-Hao Wu ◽  
Mao-Chieh Chen ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor ◽  
Low Dielectric Constant ◽  
Electrical Characteristics ◽  
Low Dielectric ◽  
Chemical Vapor Deposited
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