Effects of rapid thermal oxidation on electrical characteristics of chemical‐vapor‐deposited SiO2gate dielectrics

1989 ◽  
Vol 66 (11) ◽  
pp. 5641-5643 ◽  
Author(s):  
W. Ting ◽  
P. C. Li ◽  
G. Q. Lo ◽  
D. L. Kwong ◽  
N. S. Alvi
Keyword(s):  
Thermal Oxidation ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Rapid Thermal Oxidation ◽  
Chemical Vapor Deposited

Electrical characteristics of ultrathin oxynitride gate dielectric prepared by rapid thermal oxidation of Si in N2O

1990 ◽  
Vol 57 (10) ◽  
pp. 1010-1011 ◽  
Author(s):  
Hyunsang Hwang ◽  
Wenchi Ting ◽  
Bikas Maiti ◽  
Dim‐Lee Kwong ◽  
Jack Lee
Keyword(s):  
Thermal Oxidation ◽  
Gate Dielectric ◽  
Electrical Characteristics ◽  
Rapid Thermal Oxidation

Electrical characteristics of Schottky diodes fabricated using plasma assisted chemical vapor deposited diamond films

1988 ◽  
Vol 53 (7) ◽  
pp. 586-588 ◽  
Author(s):  
G. Sh. Gildenblat ◽  
S. A. Grot ◽  
C. R. Wronski ◽  
A. R. Badzian ◽  
T. Badzian ◽  
...  
Keyword(s):  
Schottky Diodes ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited

Plasma etched polycrystalline hot‐filament chemical vapor deposited diamond thin films and their electrical characteristics

1994 ◽  
Vol 65 (22) ◽  
pp. 2827-2829 ◽  
Author(s):  
B. Y. Liaw ◽  
T. Stacy ◽  
G. Zhao ◽  
E. J. Charlson ◽  
E. M. Charlson ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited ◽  
Diamond Thin Films ◽  
Hot Filament

Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films

2003 ◽  
Vol 433-436 ◽  
pp. 451-454 ◽  
Author(s):  
Hoa Thi Mai Pham ◽  
Tolgay Akkaya ◽  
Charles R. de Boer ◽  
Pasqualina M. Sarro
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited
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