Physical and Electrical Characteristics of Methylsilane- and Trimethylsilane-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Zhen-Cheng Wu; Zhi-Wen Shiung; Chiu-Chih Chiang; Wei-Hao Wu; Mao-Chieh Chen; Shwang-Ming Jeng; Weng Chang; Pei-Fen Chou; Syun-Ming Jang; Chen-Hua Yu; Mong-Song Liang

doi:10.1149/1.1369373

Physical and Electrical Characteristics of Methylsilane- and Trimethylsilane-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Journal of The Electrochemical Society ◽

10.1149/1.1369373 ◽

2001 ◽

Vol 148 (6) ◽

pp. F127 ◽

Cited By ~ 22

Author(s):

Zhen-Cheng Wu ◽

Zhi-Wen Shiung ◽

Chiu-Chih Chiang ◽

Wei-Hao Wu ◽

Mao-Chieh Chen ◽

...

Keyword(s):

Dielectric Constant ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Electrical Characteristics ◽

Low Dielectric ◽

Chemical Vapor Deposited

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Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Journal of The Electrochemical Society ◽

10.1149/1.1368108 ◽

2001 ◽

Vol 148 (6) ◽

pp. F115 ◽

Cited By ~ 21

Author(s):

Zhen-Cheng Wu ◽

Zhi-Wen Shiung ◽

Chiu-Chih Chiang ◽

Wei-Hao Wu ◽

Mao-Chieh Chen ◽

...

Keyword(s):

Dielectric Constant ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Electrical Characteristics ◽

Low Dielectric ◽

Chemical Vapor Deposited

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Effects of Post-SiH4and Plasma Treatments on Chemical Vapor Deposited Cu Seeds with Chemical Vapor Deposited TiN Barrier in Porous Low Dielectric Constant and Cu Integration

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.076501 ◽

2011 ◽

Vol 50 (7) ◽

pp. 076501 ◽

Cited By ~ 2

Author(s):

Sung Gyu Pyo ◽

Shangkyun Park ◽

Hansoo Park ◽

Donghyun Lee

Keyword(s):

Dielectric Constant ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Plasma Treatments ◽

Chemical Vapor Deposited

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Post treatments of plasma-enhanced chemical vapor deposited hydrogenated amorphous silicon carbide for low dielectric constant films

Thin Solid Films ◽

10.1016/j.tsf.2005.10.085 ◽

2006 ◽

Vol 497 (1-2) ◽

pp. 109-114 ◽

Cited By ~ 5

Author(s):

B. Lahlouh ◽

T. Rajagopalan ◽

N. Biswas ◽

J. Sun ◽

D. Huang ◽

...

Keyword(s):

Silicon Carbide ◽

Dielectric Constant ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Amorphous Silicon Carbide ◽

Low Dielectric ◽

Chemical Vapor Deposited ◽

Hydrogenated Amorphous

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Characterization of Chemical Vapor Deposited Amorphous Fluorocarbons for Low Dielectric Constant Interlayer Dielectrics

Journal of The Electrochemical Society ◽

10.1149/1.1391917 ◽

1999 ◽

Vol 146 (6) ◽

pp. 2219-2224 ◽

Cited By ~ 18

Author(s):

Indrajit Banerjee ◽

Marnie Harker ◽

L. Wong ◽

P. A. Coon ◽

Karen K. Gleason

Keyword(s):

Dielectric Constant ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Interlayer Dielectrics ◽

Low Dielectric ◽

Chemical Vapor Deposited

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Characterization of low pressure chemical vapor deposited polymeric fluorinated carbon m (C:FX)n thin films with low dielectric constant

Applied Physics A ◽

10.1007/s00339-005-3435-6 ◽

2006 ◽

Vol 83 (1) ◽

pp. 57-66 ◽

Cited By ~ 5

Author(s):

A.C. Rastogi ◽

S.B. Desu

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Chemical Vapor ◽

Low Pressure ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Chemical Vapor Deposited ◽

Pressure Chemical ◽

Fluorinated Carbon

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Effects of Post-SiH4and Plasma Treatments on Chemical Vapor Deposited Cu Seeds with Chemical Vapor Deposited TiN Barrier in Porous Low Dielectric Constant and Cu Integration

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.076501 ◽

2011 ◽

Vol 50 (7R) ◽

pp. 076501

Author(s):

Sung Gyu Pyo ◽

Shangkyun Park ◽

Hansoo Park ◽

Donghyun Lee

Keyword(s):

Dielectric Constant ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Plasma Treatments ◽

Chemical Vapor Deposited

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Effects of Post-Deposition Heat Treatment on the Properties of Low Dielectric Constant Plasma Polymerized Decahydronaphthalene Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.l1324 ◽

2000 ◽

Vol 39 (Part 2, No. 12B) ◽

pp. L1324-L1326 ◽

Cited By ~ 8

Author(s):

Jaeyoung Yang ◽

Cheonman Shim ◽

Donggeun Jung

Keyword(s):

Thin Films ◽

Heat Treatment ◽

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Post Deposition

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? Electrical conduction in low dielectric constant SiOC(-H) films with nano-pore structure using dimethyldimethoxysilane /O2 precursors deposited by plasma-enhanced chemical vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.56.1478 ◽

2010 ◽

Vol 56 (5) ◽

pp. 1478-1483 ◽

Cited By ~ 2

Author(s):

Chi Kyu Choi ◽

Jong Kwan Woo ◽

R. Navamathavan ◽

Kwang Man Lee ◽

Chang Young Kim ◽

...

Keyword(s):

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Pore Structure ◽

Electrical Conduction ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Low Dielectric

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The chemical bond structure investigation on the Si-O-C composite films with low dielectric constant deposited by high density plasma chemical vapor deposition

IEEE Conference Record - Abstracts 2002 IEEE International Conference on Plasma Science (Cat No 02CH37340) PLASMA-02 ◽

10.1109/plasma.2002.1030549 ◽

2003 ◽

Author(s):

Chang Shil Yang ◽

Kyoung Suk ◽

Chi Kyu Choi

Keyword(s):

Dielectric Constant ◽

Vapor Deposition ◽

Composite Films ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Structure Investigation ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Low Dielectric ◽

Density Plasma

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Characterization of low dielectric constant plasma polymer films deposited by plasma-enhanced chemical vapor deposition using decamethyl-cyclopentasiloxane and cyclohexane as the precursors

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2148414 ◽

2006 ◽

Vol 24 (1) ◽

pp. 165-169 ◽

Cited By ~ 11

Author(s):

Jaeyoung Yang ◽

Sungwoo Lee ◽

Hyoungsun Park ◽

Donggeun Jung ◽

Heeyeop Chae

Keyword(s):

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Polymer Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Polymer ◽

Low Dielectric Constant ◽

Low Dielectric

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