The application ofin situmonitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

2001 ◽  
Vol 19 (4) ◽  
pp. 1248-1254 ◽  
Author(s):  
Natsuko Ito ◽  
Tsuyoshi Moriya ◽  
Fumihiko Uesugi ◽  
Shuji Moriya ◽  
Masaru Aomori ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Light Scattering ◽  
Vapor Deposition ◽  
Mass Production ◽  
Laser Light ◽  
Production Condition ◽  
Chemical Vapor ◽  
Laser Light Scattering ◽  
Scattering Method ◽  
Thermal Chemical Vapor Deposition

The Utility of Laser Light Scattering in Assessing the Mixability of Reagents for Chemical Vapor Deposition

1993 ◽  
Vol 324 ◽  
Author(s):  
Bin Ni ◽  
Gene P. Reck ◽  
James W. Proscia
Keyword(s):  
Chemical Vapor Deposition ◽  
Light Scattering ◽  
Titanium Nitride ◽  
Tin Oxide ◽  
Vapor Deposition ◽  
Laser Light ◽  
Chemical Vapor ◽  
Reaction Chamber ◽  
Laser Light Scattering ◽  
Tin Oxide Films

AbstractThe premixability of reagents used in chemical vapor deposition reactors is important to insure that gas feed lines and nozzles do not become clogged with particulates during operation. Even if reactants are to be kept separate until introduced into a reaction chamber, it is desirable to limit the number of particles formed. A reactor which utilizes laser light scattering to monitor particulate formation when gaseous reagents are mixed is described. The reaction of tin (IV) chloride with water is commonly used to produce tin oxide films by chemical vapor deposition. It was found by the light scattering experiment that at temperatures above about 110°C the number of particulates formed is greatly reduced. Therefore, it would be most desirable that these reagents be mixed above this temperature when depositing tin oxide from this reaction. The reaction of titanium tetrachloride with various amine was also investigated by this method. This reaction has been demonstrated to produce titanium nitride above 450°C. For each case, it was observed that there was a temperature above which the number of particulates was significantly reduced. This temperature was always below the optimal temperature for producing titanium nitride films.

Visualization of Atmospheric Pressure Chemical Vapor Deposition and Powder Spray Pyrolysis by Laser Light Scattering

1994 ◽  
Vol 363 ◽  
Author(s):  
Limin Mao ◽  
Ogie Stewart ◽  
Gene P. Reck ◽  
James W. Proscia
Keyword(s):  
Chemical Vapor Deposition ◽  
Light Scattering ◽  
Spray Pyrolysis ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Laser Light ◽  
Chemical Vapor ◽  
Ambient Air ◽  
Laser Light Scattering ◽  
Pressure Chemical

AbstractAtmospheric Pressure Chemical Vapor Deposition (APCVD) and powder spray pyrolysis are both pyrolytic thin film deposition techniques that are used to coat glass with thin films at atmospheric pressure. In the present study, the fluid dynamics of each process was investigated by laser light scattering. For each system, a 193 nm ArF excimer laser pulsed at 7 Hz was used for the analysis. In the case of the APCVD reactor, the difference in Rayleigh scattering between helium injected in the reactor and ambient air was used to characterize the process. For the powder spray process, laser scattering off the sprayed powder was used. The effect of various parameters is discussed.

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