scholarly journals Degradation Mechanisms of GaN HEMTs With p-Type Gate Under Forward Gate Bias Overstress

2018 ◽  
Vol 65 (7) ◽  
pp. 2778-2783 ◽  
Author(s):  
M. Ruzzarin ◽  
M. Meneghini ◽  
A. Barbato ◽  
V. Padovan ◽  
O. Haeberlen ◽  
...  
2018 ◽  
Vol 65 (1) ◽  
pp. 38-44 ◽  
Author(s):  
Andrea Natale Tallarico ◽  
Steve Stoffels ◽  
Niels Posthuma ◽  
Paolo Magnone ◽  
Denis Marcon ◽  
...  

Micromachines ◽  
2021 ◽  
Vol 12 (4) ◽  
pp. 400
Author(s):  
Van Cuong Nguyen ◽  
Kwangeun Kim ◽  
Hyungtak Kim

We investigated the sensing characteristics of NO2 gas sensors based on Pd-AlGaN/GaN high electron mobility transistors (HEMTs) at high temperatures. In this paper, we demonstrated the optimization of the sensing performance by the gate bias, which exhibited the advantage of the FET-type sensors compared to the diode-type ones. When the sensor was biased near the threshold voltage, the electron density in the channel showed a relatively larger change with a response to the gas exposure and demonstrated a significant improvement in the sensitivity. At 300 °C under 100 ppm concentration, the sensor’s sensitivities were 26.7% and 91.6%, while the response times were 32 and 9 s at VG = 0 V and VG = −1 V, respectively. The sensor demonstrated the stable repeatability regardless of the gate voltage at a high temperature.


2008 ◽  
Vol 600-603 ◽  
pp. 1187-1190 ◽  
Author(s):  
Q. Jon Zhang ◽  
Charlotte Jonas ◽  
Joseph J. Sumakeris ◽  
Anant K. Agarwal ◽  
John W. Palmour

DC characteristics of 4H-SiC p-channel IGBTs capable of blocking -12 kV and conducting -0.4 A (-100 A/cm2) at a forward voltage of -5.2 V at 25°C are demonstrated for the first time. A record low differential on-resistance of 14 mW×cm2 was achieved with a gate bias of -20 V indicating a strong conductivity modulation in the p-type drift region. A moderately doped current enhancement layer grown on the lightly doped drift layer effectively reduces the JFET resistance while maintains a high carrier lifetime for conductivity modulation. A hole MOS channel mobility of 12.5 cm2/V-s at -20 V of gate bias was measured with a MOS threshold voltage of -5.8 V. The blocking voltage of -12 kV was achieved by Junction Termination Extension (JTE).


2005 ◽  
Vol 86 (6) ◽  
pp. 062104 ◽  
Author(s):  
June-O Song ◽  
Joon Seop Kwak ◽  
Yongjo Park ◽  
Tae-Yeon Seong

2016 ◽  
Vol 58 ◽  
pp. 177-184 ◽  
Author(s):  
M. Meneghini ◽  
O. Hilt ◽  
C. Fleury ◽  
R. Silvestri ◽  
M. Capriotti ◽  
...  
Keyword(s):  

2019 ◽  
Vol 28 (8) ◽  
pp. 088502
Author(s):  
Chao-Yang Han ◽  
Yuan Liu ◽  
Yu-Rong Liu ◽  
Ya-Yi Chen ◽  
Li Wang ◽  
...  

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