TRG-OES measurements of electron temperatures during fluorocarbon plasma etching of SiO/sub 2/ damage test wafers

2002 ◽  
Author(s):  
M.J. Schabel ◽  
V.M. Donnelly ◽  
K.P. Cheung ◽  
A. Kornblit ◽  
N. Layadi ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Fluorocarbon Plasma

Analysis of plasma etching resistance for commercial quartz glasses used in semiconductor apparatus in fluorocarbon plasma

2021 ◽  
pp. 125015
Author(s):  
Jae Ho Choi ◽  
JiSob Yoon ◽  
YoonSung Jung ◽  
Kyung Won Min ◽  
Won Bin Im ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Fluorocarbon Plasma ◽  
Quartz Glasses

Surface Reaction and Topography Modeling of Fluorocarbon Plasma Etching

2021 ◽  
Author(s):  
Francio Rodrigues ◽  
Luiz Felipe Aguinsky ◽  
Alexander Toifl ◽  
Alexander Scharinger ◽  
Andreas Hossinger ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Surface Reaction ◽  
Fluorocarbon Plasma

Fluorocarbon plasma etching of silicon: Factors controlling etch rate

2004 ◽  
Vol 96 (1) ◽  
pp. 65-70 ◽  
Author(s):  
David Humbird ◽  
David B. Graves
Keyword(s):  
Plasma Etching ◽  
Etch Rate ◽  
Fluorocarbon Plasma

scholarly journals Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films

Coatings ◽  
2020 ◽  
Vol 10 (7) ◽  
pp. 637
Author(s):  
Wei-Kai Wang ◽  
Sung-Yu Wang ◽  
Kuo-Feng Liu ◽  
Pi-Chuen Tsai ◽  
Yu-Hao Zhang ◽  
...  
Keyword(s):  
Yttrium Oxide ◽  
Plasma Etching ◽  
Photoelectron Spectroscopy ◽  
Film Surface ◽  
Chemical Compositions ◽  
Plasma Irradiation ◽  
Fluorocarbon Plasma ◽  
Sulfur Fluoride ◽  
Pre Treatment ◽  
Sputter Deposited

Yttrium oxyfluoride (YOF) protective materials were fabricated on sputter-deposited yttrium oxide (Y2O3) by high-density (sulfur fluoride) SF6 plasma irradiation. The structures, compositions, and fluorocarbon-plasma etching behaviors of these films were systematically characterized by various techniques. After exposure to SF6 plasma, the Y2O3 film surface was fluorinated significantly to form a YOF film with an approximate average thickness of 30 nm. X-ray photoelectron spectroscopy revealed few changes in the elemental and chemical compositions of the surface layer after fluorination, confirming the chemical stability of the YOF/Y2O3 sample. Transmission electron microscopy confirmed a complete lattice pattern on the YOF/Y2O3 structure after fluorocarbon plasma exposure. These results indicate that the SF6 plasma-treated Y2O3 film is more erosion resistant than the commercial Y2O3 coating, and thus accumulates fewer contamination particles.

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