Temporal control of radicals for high crystallinity of microcrystalline silicon films in UHF SiH/sub 4//H/sub 2/ pulse-modulated plasma CVD

2003 ◽  
Author(s):  
M. Matsutani ◽  
N. Hori ◽  
M. Hori ◽  
T. Goto ◽  
T. Tsukada
Keyword(s):  
Silicon Films ◽  
Temporal Control ◽  
Plasma Cvd ◽  
Microcrystalline Silicon ◽  
High Crystallinity

Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD

2010 ◽  
Author(s):  
Takeaki Matsunaga ◽  
Yuki Kawashima ◽  
Kazunori Koga ◽  
Kenta Nakahara ◽  
William Makoto Nakamura ◽  
...  
Keyword(s):  
Discharge Plasma ◽  
Silicon Films ◽  
Plasma Cvd ◽  
Microcrystalline Silicon

Microcrystalline Silicon Films Deposited by Cathode‐Type RF Glow Discharge Technique

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka
Keyword(s):  
Glow Discharge ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Rf Glow Discharge

Preparation and properties of microcrystalline silicon films using photochemical vapor deposition

1983 ◽  
Vol 59-60 ◽  
pp. 715-718 ◽  
Author(s):  
Tadashi Saitoh ◽  
Toshikazu Shimada ◽  
Masataka Migitaka ◽  
Yasuo Tarui
Keyword(s):  
Vapor Deposition ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Photochemical Vapor Deposition

STM on doped and undoped hydrogenated amorphous and microcrystalline silicon films

1992 ◽  
Vol 42-44 ◽  
pp. 1398-1402 ◽  
Author(s):  
W. Zimmermann-Edling ◽  
R. Wiesendanger ◽  
F. Finger ◽  
K. Prasad ◽  
A. Shah
Keyword(s):  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Hydrogenated Amorphous

Study of metastabilities in microcrystalline silicon films by photoconductivity techniques

2006 ◽  
Vol 501 (1-2) ◽  
pp. 129-132 ◽  
Author(s):  
N. Souffi ◽  
G.H. Bauer ◽  
R. Brüggemann
Keyword(s):  
Silicon Films ◽  
Microcrystalline Silicon
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