Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films

2002 ◽  
Author(s):  
R.A. Donaton ◽  
F. Iacopi ◽  
R. Baklanov ◽  
D. Shamiryan ◽  
B. Coenegrachts ◽  
...  
Keyword(s):  
Electrical Characterization ◽  
Dielectric Films ◽  
Low K

Electrical Characterization of Sub-30nm Gatelength SOI MOSFETs

2004 ◽  
Author(s):  
Terence Kane ◽  
Michael P. Tenney
Keyword(s):  
Electrical Characterization ◽  
Dielectric Films ◽  
Atomic Force ◽  
Soi Devices ◽  
Low K

Abstract Atomic Force Probe (AFP) techniques are well suited for the electrical characterization of sub-65nm node SOI devices with multiple metal interconnect levels and low-k interlevel dielectric films. This paper discusses the use of these techniques on sub-30nm gatelength SOI MOSFETs.

scholarly journals Electrical characterization of amorphous Al2O3 dielectric films on n-type 4H-SiC

AIP Advances ◽  
2018 ◽  
Vol 8 (2) ◽  
pp. 025304 ◽  
Author(s):  
R. Y. Khosa ◽  
E. B. Thorsteinsson ◽  
M. Winters ◽  
N. Rorsman ◽  
R. Karhu ◽  
...  
Keyword(s):  
Electrical Characterization ◽  
Dielectric Films ◽  
Amorphous Al2o3

Electrochemical, Physical, and Electrical Characterization of Two Clean Solutions for Cu PCMP Clean

2012 ◽  
Vol 187 ◽  
pp. 235-239
Author(s):  
Yun Long Li ◽  
Nancy Heylen ◽  
Jerome Daviot ◽  
Chris Reid ◽  
Leonardus Leunissen
Keyword(s):  
Electrical Characterization ◽  
Integration Scheme ◽  
Electrical Characterizations ◽  
Low K

Cu post-CMP clean is important to keep both Cu and low-k dielectric clean after polishing. In this paper, two Cu post-CMP clean solutions are analyzed in electrochemical, physical and electrical characterizations, based on the material and integration scheme of imec 65nm platform. It is shown that the combination of these two PCMP clean solutions can achieve both reasonable cleaning efficiencies and reliable low-k dielectric lifetime.

Electrical characterization of FSG low K dielectric deposition in HDP and PECVD tools

1997 ◽  
Author(s):  
Gennadi Bersuker ◽  
Michael J. Shapiro ◽  
James Werking ◽  
Sang U. Kim
Keyword(s):  
Electrical Characterization ◽  
Low K
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