Profile control in isotropic plasma etching

Author(s):  
H. Zhu ◽  
R. Lindquist
2005 ◽  
Vol 04 (04) ◽  
pp. 701-707
Author(s):  
KWONG-LUCK TAN ◽  
CIPRIAN ILIESCU ◽  
FRANCIS TAY ◽  
HUI-TONG CHUA ◽  
JIANMIN MIAO

The paper presents the fabrication of nanotips cold-end contact for microcooling system. The fabrication process is based on an optimized isotropic plasma etching in SF 6/ O 2 using an ICP-deep RIE system from STS. We managed to fabricate the radius of the nanotips which are below 50 nm.


Small ◽  
2009 ◽  
Vol 5 (5) ◽  
pp. 583-586 ◽  
Author(s):  
Chunyu Huang ◽  
Bin Dong ◽  
Nan Lu ◽  
Bingjie Yang ◽  
Liguo Gao ◽  
...  

2009 ◽  
Vol 19 (20) ◽  
pp. 3279-3284 ◽  
Author(s):  
Alfred Plettl ◽  
Fabian Enderle ◽  
Marc Saitner ◽  
Achim Manzke ◽  
Christian Pfahler ◽  
...  

1989 ◽  
Vol 7 (3) ◽  
pp. 670-675 ◽  
Author(s):  
W. G. M. van den Hoek ◽  
T. E. Wicker ◽  
B. F. Westlund ◽  
G. B. Powell

1982 ◽  
Vol 129 (2) ◽  
pp. 393-396 ◽  
Author(s):  
R. H. Bruce ◽  
A. R. Reinberg

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