Elimination of kink effect in fully depleted complementary buried-channel SOL MOSFET (FD CBCMOS) based on silicon direct bonding technology

1991 ◽  
Vol 12 (3) ◽  
pp. 101-103 ◽  
Author(s):  
Qin-Yi Tong ◽  
Xiao-Li Xu ◽  
Hui-Zhen Zhang
1995 ◽  
Vol 31 (4) ◽  
pp. 326-327 ◽  
Author(s):  
F. Balestra ◽  
T. Matsumoto ◽  
H. Nakabayashi ◽  
M. Koyanagi ◽  
M. Tsuno ◽  
...  
Keyword(s):  

2002 ◽  
Vol 02 (03) ◽  
pp. L253-L256 ◽  
Author(s):  
S. HAENDLER ◽  
J. JOMAAH ◽  
F. BALESTRA

The low frequency noise (LFN) behavior in 0.15 μm N-channel fully depleted SOI/MOS transistors is investigated, both in ohmic and saturation regimes. The extraction of the interface trap density is also carried out. Moreover, the existence of a moderate kink effect and its influence on LF noise in fully depleted devices are shown.


NANO ◽  
2015 ◽  
Vol 10 (07) ◽  
pp. 1550093 ◽  
Author(s):  
Avi Karsenty ◽  
Avraham Chelly

Nanoscale MOSFETs Gate-Recessed Channel (GRC) device with a silicon channel thickness (t SI ) as low as 2.2 nm was first tested at room temperature for functionality check, and then tested at low temperature (77 K) for I–V characterizations. In spite of its FD-SOI nanoscale thickness, the GRC device has surprisingly exhibited a Kink Effect in the output characteristics at 77 K. The anomalous Kink Effect can be explained by the increase of the lateral electric field in the drain junction with the channel extension zone when lowering the temperature.


1994 ◽  
Vol 30 (17) ◽  
pp. 1456-1458 ◽  
Author(s):  
D. De Ceuster ◽  
D. Flandre
Keyword(s):  

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